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1. (WO1998051839) PROCESSING INSERT, AND PRODUCTION OF SAME
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/1998/051839 International Application No.: PCT/DE1998/001237
Publication Date: 19.11.1998 International Filing Date: 02.05.1998
Chapter 2 Demand Filed: 02.12.1998
IPC:
C23C 16/32 (2006.01) ,C23C 16/34 (2006.01) ,C23C 16/36 (2006.01) ,C23C 30/00 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
22
characterised by the deposition of inorganic material, other than metallic material
30
Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
32
Carbides
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
22
characterised by the deposition of inorganic material, other than metallic material
30
Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
34
Nitrides
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
22
characterised by the deposition of inorganic material, other than metallic material
30
Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
36
Carbo-nitrides
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
30
Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
Applicants:
WIDIA GMBH [DE/DE]; Münchener Strasse 90 D-45145 Essen, DE (AllExceptUS)
KÖNIG, Udo [DE/DE]; DE (UsOnly)
VAN DEN BERG, Hendrikus [NL/NL]; NL (UsOnly)
WESTPHAL, Hartmut [DE/DE]; DE (UsOnly)
SOTTKE, Volkmar [DE/DE]; DE (UsOnly)
Inventors:
KÖNIG, Udo; DE
VAN DEN BERG, Hendrikus; NL
WESTPHAL, Hartmut; DE
SOTTKE, Volkmar; DE
Agent:
VOMBERG, Friedhelm; Schulstrasse 8 D-42653 Solingen, DE
Priority Data:
197 19 195.909.05.1997DE
Title (DE) SCHNEIDEINSATZ ZUM ZERSPANEN UND VERFAHREN ZUR HERSTELLUNG DIESES SCHNEIDEINSATZES
(EN) PROCESSING INSERT, AND PRODUCTION OF SAME
(FR) OUTIL RAPPORTE D'USINAGE, ET SON PROCEDE DE FABRICATION
Abstract:
(DE) Die Erfindung betrifft einen Schneideinsatz zum Zerspanen, bestehend aus einem Hartmetall-, Cermet- oder Keramik-Substratkörper mit einer mehrlagigen Beschichtung und ein Verfahren zu seiner Herstellung. Insbesondere um einen Schneideinsatz mit hoher Bruchzähigkeit bis hin zu relativ großen Schichtdicken zu gewährleisten, wird eine äußere Schicht (Deckschicht) aus einer ein- oder mehrphasigen Schicht aus Carbiden, Nitriden oder Carbonitriden auf Zr- oder Hf-Basis vorgeschlagen, die mittels CVD aufgetragen worden ist und die innere Druckspannungen aufweist. Die darunterliegende, ebenfalls mittels CVD aufgetragene Schicht bzw. Schichten weisen ausnahmslos innere Zugspannungen auf, wobei mindestens eine oder die einzige darunterliegende Schicht aus TiN, TiC und/oder TiCN besteht. Die Beschichtung wird durch einen ununterbrochenen CVD-Prozeß bei Temperaturen zwischen 900 °C und 1100 °C durch jeweilige Wechsel der Gaszusammensetzungen aufgetragen.
(EN) The invention pertains to a processing insert comprised of a body with a hard metal or cermet or ceramic substrate and with a multilayer coating, and the manufacture of same. In order to have a highly fracture-tough insert with a relatively thick coating, it is suggested that an external layer (protective layer) be applied according to the CVD process, said layer being either a monophase or multiphase layer of Zr-based or Hf-based carbide, nitride or carbonitride, and presenting internal compressive stresses. The layer(s) underlying the external layer, also applied according to the CVD process, also present(s), without any exception, internal compressive stresses, while at least one of them, maybe the only one laying under the protective layer, is made of TiN, TiC and/or TiCN. The coating is applied according to a continuous CVD process at temperatures of 900 °C to 1100 °C and involves a specific modification of the gas compounds.
(FR) La présente invention concerne un outil rapporté d'usinage constitué d'un corps à substrat de métal dur, de cermet ou de céramique, avec revêtement multicouche, ainsi que son procédé de fabrication. Pour avoir un outil rapporté de grande résistance à la rupture jusqu'à des épaisseurs de couche relativement importantes, il est proposé une couche extérieure (couche de protection) qui serait une couche monophase ou multiphase de carbures, nitrures ou carbonitrures à base de Zr ou de Hf, appliquée par dépôt chimique en phase vapeur et présentant des contraintes de compression internes. La couche ou les couches se trouvant sous celle-ci, également appliquée(s) par dépôt chimique en phase vapeur, présente(nt) aussi, sans exception, des contraintes de compression internes, l'une d'elle au moins, voire la seule couche se trouvant sous la couche de protection étant constituée de TiN, TiC et/ou TiCN. Le revêtement est appliqué par un processus ininterrompu de dépôt chimique en phase vapeur à des températures comprises entre 900 °C et 1.100 °C par modification respective des compositions gazeuses.
Designated States: BR, CA, CN, CZ, HU, JP, KR, MX, US
European Patent Office (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE)
Publication Language: German (DE)
Filing Language: German (DE)
Also published as:
EP0980445US6350510