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1. (WO1998051390) VAPOR LIQUID CONTACT TRAY WITH RELIEF WEIR SUMPS
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/1998/051390 International Application No.: PCT/US1998/009808
Publication Date: 19.11.1998 International Filing Date: 12.05.1998
Chapter 2 Demand Filed: 26.10.1998
IPC:
B01D 3/20 (2006.01) ,B01D 3/22 (2006.01)
B PERFORMING OPERATIONS; TRANSPORTING
01
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
D
SEPARATION
3
Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
14
Fractional distillation
16
Fractionating columns in which vapour bubbles through liquid
18
with horizontal bubble plates
20
Bubble caps; Risers for vapour; Discharge pipes for liquid
B PERFORMING OPERATIONS; TRANSPORTING
01
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
D
SEPARATION
3
Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
14
Fractional distillation
16
Fractionating columns in which vapour bubbles through liquid
22
with horizontal sieve plates or grids; Construction of sieve plates or grids
Applicants:
KOCH-GLITSCH, INC. [US/US]; 4111 East 37th Street North Wichita, KS 67220, US
Inventors:
HSIEH, Chang-Li; US
Agent:
HURD, Michael, B. ; Shook, Hardy & Bacon L.L.P One Kansas City Place 1200 Main Street Kansas City, MO 64105, US
Priority Data:
60/046,23012.05.1997US
Title (EN) VAPOR LIQUID CONTACT TRAY WITH RELIEF WEIR SUMPS
(FR) PLATEAU DE CONTACT VAPEUR-LIQUIDE COMPORTANT DES BACS DE DEVERSOIR DE DECHARGE
Abstract:
(EN) A vapor-liquid contact tray (16) is provided with a tray deck (40) containing vapor flow apertures (48) and a downcomer (50) positioned at an opening (46) in the tray deck (40). Spaced apart sumps (60) are positioned in cutouts (61a and 61b) formed in the tray deck (40) and inlet wall (52) of the downcomer (50) to receive liquid from the tray deck (40) and convey it into the downcomer (50). As a vapor-liquid mixture or froth descends into the sumps (60), vapor is able to disengage from the liquid, thereby increasing the liquid handling capacity of the downcomer (50). A weir (70) positioned along the outlet end of the tray deck (40) causes liquid to accumulate to a preselected level on the tray deck (40) before it overflows the weir (70) and enters the sumps (60) and downcomer (50). End portions (74) of the weir (70) are displaced in the upstream direction around the cutouts (61a) in the tray deck (40), thereby increasing the overall length of the weir (70).
(FR) L'invention concerne un plateau (16) de contact vapeur-liquide comportant une plate-forme de plateau (40) présentant des orifices d'écoulement de vapeur (48) et un trop plein (50) disposé à une ouverture (46) de la plate-forme de plateau (40). Des bacs (60) espacés sont disposés dans des évidements (61a) et (61b) formés dans la plate-forme de plateau (40) et une paroi d'admission (52) du trop plein (50) pour recevoir un liquide provenant de la plate-forme de plateau (40) et le transporter dans le trop plein (50). Lorsqu'un mélange vapeur-liquide ou de la mousse descend dans les bacs (60), de la vapeur peut se dégager du liquide, ce qui augmente la capacité de manipulation de liquide du trop plein (50). Un déversoir (70) disposé le long de l'extrémité de sortie de la plate-forme de plateau (40) entraîne l'accumulation d'un liquide à un niveau prédéterminé sur la plate-forme de plateau (40) avant qu'il déborde du déversoir (70) et s'écoule dans les bacs (60) et le trop plein (50). Des parties d'extrémité (74) du déversoir (70) sont déplacées en amont autour des évidements (61a) de la plate-forme de plateau (40), augmentant ainsi la longueur totale du déversoir (70).
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Designated States: AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, CA, CH, CN, CU, CZ, DE, DK, EE, ES, FI, GB, GE, GH, GM, GW, HU, ID, IL, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MD, MG, MK, MN, MW, MX, NO, NZ, PL, PT, RO, RU, SD, SE, SG, SI, SK, SL, TJ, TM, TR, TT, UA, UG, UZ, VN, YU, ZW
African Regional Intellectual Property Organization (ARIPO) (GH, GM, KE, LS, MW, SD, SZ, UG, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)
Also published as:
AU1998075716