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1. (WO1998050757) THREE DIMENSIONAL INSPECTION SYSTEM
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/1998/050757 International Application No.: PCT/US1998/008950
Publication Date: 12.11.1998 International Filing Date: 04.05.1998
Chapter 2 Demand Filed: 18.11.1998
IPC:
G01N 21/88 (2006.01) ,G06T 7/00 (2006.01) ,G06T 7/60 (2006.01) ,H05K 13/08 (2006.01)
G PHYSICS
01
MEASURING; TESTING
N
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21
Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible, or ultra-violet light
84
Systems specially adapted for particular applications
88
Investigating the presence of flaws, defects or contamination
G PHYSICS
06
COMPUTING; CALCULATING; COUNTING
T
IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
7
Image analysis, e.g. from bit-mapped to non bit-mapped
G PHYSICS
06
COMPUTING; CALCULATING; COUNTING
T
IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
7
Image analysis, e.g. from bit-mapped to non bit-mapped
60
Analysis of geometric attributes, e.g. area, centre of gravity, perimeter, from an image
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
K
PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
13
Apparatus or processes specially adapted for manufacturing or adjusting assemblages of electric components
08
Monitoring manufacture of assemblages
Applicants:
BEATY, Elwin, M. [US/US]; US
Inventors:
BEATY, Elwin, M.; US
MORK, David, P.; US
Agent:
MOFFA, Emil ; Moffa & Associates, P.A. Suite 1275 601 Carlson Parkway Minnetonka, MN 55305, US
Priority Data:
08/850,47305.05.1997US
Title (EN) THREE DIMENSIONAL INSPECTION SYSTEM
(FR) SYSTEME DE CONTROLE TRIDIMENSIONNEL
Abstract:
(EN) A part inspection and calibration method for the inspection of printed circuit boards and integrated circuits includes a camera (10) to image a precision pattern mask (Fig. 4) deposited on a transparent reticle (20). Small parts (30) are placed on or above the transparent reticle (20) to be inspected. An overhead mirror or prism (40) reflects a side view of the part (30) under inspection to the camera (10). The scene of the part (30) is triangulated and the dimensions of the system can thus be calibrated. A precise reticle mask (Fig. 4) with dot patterns gives an additional set of information needed for calibration. By imagining more than one dot pattern the missing state values can be resolved using an iterative trigonometric solution. The system optics are designed to focus images for all perspectives without the need for an additional focusing element.
(FR) L'invention concerne un procédé de contrôle et d'étalonnage d'éléments, pour le contrôle de cartes imprimées et de circuits intégrés, qui comprend une caméra (10) pour l'imagerie d'un masque de configuration de précision (figure 4) déposé sur un réticule transparent (20). De petits éléments (30) sont placés sur le réticule transparent (20) ou au-dessus de lui, aux fins de contrôle. Un miroir ou prisme surélevé (40) donne à la caméra (10) une vue latérale de l'élément (30) inspecté. La représentation de l'élément (30) est triangulée, et il est ainsi possible d'étalonner les dimensions du système. Un masque unitaire précis (figure 4) comportant des configurations de points donne les informations complémentaires requises aux fins d'étalonnage. L'imagerie de plusieurs configurations de points permet de déterminer les valeurs d'état manquantes par le biais d'une solution trigonométrique itérative. La structure optique du système est conçue pour la mise au point d'images correspondant à toutes les perspectives, sans qu'il soit nécessaire de recourir à un élément de focalisation supplémentaire.
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Designated States: CN, JP, KR, SG
European Patent Office (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE)
Publication Language: English (EN)
Filing Language: English (EN)
Also published as:
KR1020010012293SG68858EP1017962US5909285JP2002515124