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1. (WO1998050516) NON-CORROSIVE STRIPPING AND CLEANING COMPOSITION
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/1998/050516    International Application No.:    PCT/US1998/008702
Publication Date: 12.11.1998 International Filing Date: 30.04.1998
Chapter 2 Demand Filed:    04.12.1998    
IPC:
C11D 7/26 (2006.01), C11D 7/32 (2006.01), C11D 7/34 (2006.01), C11D 7/50 (2006.01)
Applicants: OLIN MICROELECTRONIC CHEMICALS, INC. [US/US]; 350 Knotter Drive, Cheshire, CT 06410-0586 (US)
Inventors: HONDA, Kenji; (US).
MOLIN, Richard, Mark; (US).
HANSEN, Gale, Lynne; (US)
Agent: GREELEY, Paul, D.; Ohlandt, Greeley, Ruggiero & Perle, Suite 903, One Landmark Square, Stamford, CT 06901-2682 (US)
Priority Data:
08/850,991 05.05.1997 US
Title (EN) NON-CORROSIVE STRIPPING AND CLEANING COMPOSITION
(FR) COMPOSITION NON CORROSIVE DE DECAPAGE ET NETTOYAGE D'AGENTS DE RESERVE
Abstract: front page image
(EN)The present invention is directed to a non-corrosive photoresist stripping and cleaning composition, comprising: (a) about 5 % to about 50 % solvent selected from the group consisting of N-methyl-2-pyrrolidinone, N-hydroxyethyl-2-pyrrolidinone, 1,3-dimethyl-2-imidazolidinone, dimethylsulfoxide, N,N-dimethylacetamide, diacetone alcohol, ethylene glycol, propylene glycol and admixtures thereof; (b) about 10 % to about 90 % of an alkanolamine selected from the group consisting of diethyleneglycolamine, monoethanolamine, diethanolamine, triethanolamine, 2-(2-aminoethylamino)ethanol, and admixtures thereof; (c) about 0.1 % to about 4 % of Formula (I) where R1-R4 are individually selected from the group consisting of hydrogen, alkyl groups having 1-4 carbon atoms, alkoxy groups having 1-4 carbon atoms, halogen groups, amino groups, hydroxyl groups, carboxyl groups or combinations thereof; and (d) about 0.1 % to about 40 % of water, all percentages by weight of the total stripping and cleaning composition.
(FR)L'invention porte sur une composition non corrosive de décapage et nettoyage d'agents de réserve comprenant: (a) d'environ 5 % à environ 50 % d'un solvant choisis parmi N-méthyl-2-pyrrolidinone, N-hydroxyéthyl-2-pyrrolidinone, 1,3-diméthyl-2-imidazolidinone, diméthylsulfoxyde, N,N-diméthylacétamide, alcool diacétonique, éthylène glycol, propylène glycol, et leurs mélanges; (b) d'environ 10 % à environ 90 % d'une alcanolamine choisis parmi diéthylèneglycolamine, monoéthanolamine, diéthanolamine, triéthanolamine, 2-(2-aminoéthylamino)éthanol, et leurs mélanges; (c) d'environ 0,1 % à environ 4 % de la formule (I) dans laquelle R1 et R4 sont sélectionnés individuellement parmi H, C1-4 alkyle, C1-4 alkoxy, halogène, amino, hydroxyl, carboxyles ou leurs combinaisons; et (d) d'environ 0,1 % à environ 40 % d'eau, tous les pourcentages étant calculés par rapport au poids total de la composition de décapage et de nettoyage.
Designated States: AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, CA, CH, CN, CU, CZ, DE, DK, EE, ES, FI, GB, GE, GH, GM, GW, HU, ID, IL, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MD, MG, MK, MN, MW, MX, NO, NZ, PL, PT, RO, RU, SD, SE, SG, SI, SK, SL, TJ, TM, TR, TT, UA, UG, UZ, VN, YU, ZW.
African Regional Intellectual Property Organization (GH, GM, KE, LS, MW, SD, SZ, UG, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)