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1. (WO1998050510) HARD SURFACE CLEANING COMPOSITION
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/1998/050510    International Application No.:    PCT/EP1998/002575
Publication Date: 12.11.1998 International Filing Date: 23.04.1998
Chapter 2 Demand Filed:    09.10.1998    
IPC:
C11D 1/14 (2006.01), C11D 1/66 (2006.01), C11D 1/83 (2006.01), C11D 3/20 (2006.01), C11D 3/33 (2006.01), C11D 3/43 (2006.01)
Applicants: UNILEVER PLC [GB/GB]; Unilever Hourse, Blackfriars, London EC4P 4BQ (GB) (AU, BB, CA, CY, GB, GH, GM, IE, IL, KE, LC, LK, LS, MN, MW, NZ, SD, SG, SL, SZ, TT, UG, ZW only).
UNILEVER N.V. [NL/NL]; Weena 455, NL-3013 AL Rotterdam (NL) (AL, AM, AT, AZ, BA, BE, BF, BG, BJ, BR, BY, CF, CG, CH, CI, CM, CN, CU, CY, CZ, DE, DK, EE, ES, FI, FR, GA, GB, GE, GH, GM, GN, GR, GW, HU, ID, IE, IS, IT, JP, KE, KG, KP, KR, KZ, LR, LS, LT, LU, LV, MC, MD, MG, MK, ML, MR, MW, MX, NE, NL, NO, PL, PT, RO, RU, SD, SE, SI, SK, SN, SZ, TD, TG, TJ, TM, TR, UA, UG, UZ, VN, YU, ZW only)
Inventors: CROWLEY, Giles, James; (GB).
CULLEN, George, Hunter; (GB).
MARTIN, Alexander; (GB)
Agent: DEKKER, Enno, Ernst, Jan; Unilever N.V., Patent Division, P.O. Box 137, NL-3130 AC Vlaardingen (NL)
Priority Data:
9709065.8 02.05.1997 GB
Title (EN) HARD SURFACE CLEANING COMPOSITION
(FR) COMPOSITION DE NETTOYAGE POUR SURFACES DURES
Abstract: front page image
(EN)The invention provides a hard surface cleaning composition of pH 7-13 comprising: a) a surfactant selected from the group comprising anionic sulphate, anionic sulphonate, alkyl poly glycoside and mixtures thereof, b) a sequestering agent for Group II metals, and c) a solvent selected from the group comprising hexanol, methyl digol.
(FR)L'invention concerne une composition de nettoyage pour surfaces dures. Cette composition présente un pH compris entre 7 et 13, et comporte: (a) un tensio-actif sélectionné dans le groupe comprenant du sulfate anionique, du sulfonate anionique, de l'alkyl poly-glycoside et des mélanges de ces derniers; (b) un agent chélateur pour les métaux du groupe II et (c) un solvant sélectionné dans le groupe comprenant de l'héxanol et du méthyle digol.
Designated States: AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, CA, CH, CN, CU, CZ, DE, DK, EE, ES, FI, GB, GE, GH, GM, GW, HU, ID, IL, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MD, MG, MK, MN, MW, MX, NO, NZ, PL, PT, RO, RU, SD, SE, SG, SI, SK, SL, TJ, TM, TR, TT, UA, UG, UZ, VN, YU, ZW.
African Regional Intellectual Property Organization (GH, GM, KE, LS, MW, SD, SZ, UG, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)