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1. (WO1998049603) ANTIREFLECTIVE COATING COMPOSITIONS FOR PHOTORESIST COMPOSITIONS AND USE THEREOF
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/1998/049603 International Application No.: PCT/EP1998/002334
Publication Date: 05.11.1998 International Filing Date: 21.04.1998
Chapter 2 Demand Filed: 18.11.1998
IPC:
C09B 69/10 (2006.01) ,G03F 7/09 (2006.01)
C CHEMISTRY; METALLURGY
09
DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
B
ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES; MORDANTS; LAKES
69
Dyes not provided for by a single group of this subclass
10
Polymeric dyes; Reaction products of dyes with monomers or with macromolecular compounds
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
09
characterised by structural details, e.g. supports, auxiliary layers
Applicants:
CLARIANT INTERNATIONAL, LTD. [CH/CH]; Rothausstrasse 61 CH-4132 Muttenz 1, CH
Inventors:
DING, Shuji; US
LU, Ping-Hung; US
KHANNA, Dinesh, N.; US
SHAN, Jianhui; US
DURHAM, Dana, L.; US
DAMMEL, Ralph, R.; US
RAHMAN, M., Dalil; US
Agent:
HÜTTER, Klaus; Clariant GmbH Patente, Marken und Lizenzen Building K801, Room 2027 D-65926 Frankfurt am Main, DE
Priority Data:
08/841,75030.04.1997US
Title (EN) ANTIREFLECTIVE COATING COMPOSITIONS FOR PHOTORESIST COMPOSITIONS AND USE THEREOF
(FR) COMPOSITIONS DE REVETEMENT ANTIREFLET POUR DES COMPOSITIONS DE PHOTORESIST, ET UTILISATION DE CES DERNIERES
Abstract:
(EN) The present invention relates to an antireflective coating composition comprising a novel polymer in a solvent composition. The invention further comprises processes for using the antireflective coating composition in photolithography. The antireflective coating composition comprises a novel polymer and a solvent composition, where the novel polymer of the antireflective coating comprises at least one unit containing a dye that absorbs from about 180 nm to about 450 nm and at least one unit that contains no aromatic functionality. The solvent may be organic, preferably, a solvent of low toxicity, or it may be water, which may additionally contain other water miscible organic solvents.
(FR) La présente invention concerne une composition de revêtement antireflet comprenant un nouveau polymère dans une composition de solvant. L'invention traite, en outre, de procédés d'utilisation de la composition de revêtement antireflet en photolithographie. Cette composition de revêtement antireflet comprend un nouveau polymère, et une composition solvante, dans laquelle le nouveau polymère du revêtement antireflet comprend au moins une unité contenant un colorant qui absorbe entre 180 et 450 nm, environ, et au moins une unité qui ne contient pas de fonctionnalité aromatique. Ce solvant peut être organique, de préférence, un solvant de faible toxicité, ou ce peut être de l'eau qui peut, en outre, contenant d'autres solvants organiques miscibles dans l'eau.
Designated States: CN, JP, KR, SG
European Patent Office (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE)
Publication Language: English (EN)
Filing Language: English (EN)
Also published as:
KR1020010020358SG67843EP0978016JP2000512402 CN1253639