Search International and National Patent Collections
Some content of this application is unavailable at the moment.
If this situation persists, please contact us atFeedback&Contact
1. (WO1998049600) PHOTOSENSITIVE COMPOSITION AND METHOD OF PATTERN FORMATION
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/1998/049600 International Application No.: PCT/JP1998/001926
Publication Date: 05.11.1998 International Filing Date: 27.04.1998
IPC:
G03F 7/00 (2006.01) ,G03F 7/012 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
008
Azides
012
Macromolecular azides; Macromolecular additives, e.g. binders
Applicants:
TOYO GOSEI KOGYO CO., LTD. [JP/JP]; 1603, Kamimyoden Ichikawa-shi Chiba 272-0012, JP (AT, BE, CH, CN, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, KR, LU, MC, NL, PT, SE)
WATANABE, Masaharu [JP/JP]; JP (UsOnly)
TOCHIZAWA, Noriaki [JP/JP]; JP (UsOnly)
IMAMURA, Yukari [JP/JP]; JP (UsOnly)
KIKUCHI, Hideo [JP/JP]; JP (UsOnly)
Inventors:
WATANABE, Masaharu; JP
TOCHIZAWA, Noriaki; JP
IMAMURA, Yukari; JP
KIKUCHI, Hideo; JP
Agent:
KURIHARA, Hiroyuki; 5th floor, Kougetsu Building 5-2, Ebisu 1-chome Shibuya-ku Tokyo 150-0013, JP
Priority Data:
9/11213830.04.1997JP
Title (EN) PHOTOSENSITIVE COMPOSITION AND METHOD OF PATTERN FORMATION
(FR) COMPOSITION PHOTOSENSIBLE ET PROCEDE POUR FORMER DES MOTIFS
Abstract:
(EN) A photosensitive composition having high resolution and sufficient sensitivity and being free from the problem of environmental pollution because no chromium compounds are used for its preparation. The composition comprises a water-soluble azide compound as a photo-cross-linking agent and a poly(N-vinylformamide) capable of photo-cross-linking therewith.
(FR) L'invention concerne une composition photosensible présentant une haute résolution et une sensibilité suffisante, qui ne pose pas de problèmes pour l'environnement parce qu'elle est préparée sans composés de chrome. Cette composition comprend un composé azide soluble dans l'eau comme agent de photoréticulation et un poly(N-vinylformamide) apte à la photoréticulation avec ledit agent.
Designated States: CN, KR, US
European Patent Office (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)
Also published as:
KR1020000022422EP0911698US6140007CN1225726