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1. (WO1998040791) POSITIONING DEVICE HAVING TWO OBJECT HOLDERS
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/1998/040791 International Application No.: PCT/IB1998/000254
Publication Date: 17.09.1998 International Filing Date: 27.02.1998
IPC:
B23Q 1/62 (2006.01) ,B23Q 11/00 (2006.01) ,G03F 7/20 (2006.01) ,H01L 21/68 (2006.01)
B PERFORMING OPERATIONS; TRANSPORTING
23
MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
Q
DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL, CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
1
Members which are comprised in the general build-up of a form of machine, particularly relatively large fixed members
25
Movable or adjustable work or tool supports
44
using particular mechanisms
56
with sliding pairs only
60
two sliding pairs only
62
with perpendicular axes, e.g. cross-slides
B PERFORMING OPERATIONS; TRANSPORTING
23
MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
Q
DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL, CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
11
Accessories fitted to machine tools for keeping tools or parts of the machine in good working condition or for cooling work; Safety devices specially combined with or arranged in, or specially adapted for use in connection with, machine tools
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
68
for positioning, orientation or alignment
Applicants:
KONINKLIJKE PHILIPS ELECTRONICS N.V. [NL/NL]; Groenewoudseweg 1 NL-5621 BA Eindhoven, NL (UsOnly)
ASM Lithography B.V. [NL/NL]; De Run 1110 NL-5503 LA Veldhoven, NL (UsOnly)
LOOPSTRA, Erik, Roelof [NL/NL]; NL (UsOnly)
BONNEMA, Gerrit, Maarten [NL/NL]; NL (UsOnly)
VAN DER SCHOOT, Harmen, Klaas [NL/NL]; NL (UsOnly)
VELDHUIS, Gerjan, Peter [NL/NL]; NL (UsOnly)
KWAN, Yim, Bun, Patrick [GB/NL]; NL (UsOnly)
Inventors:
LOOPSTRA, Erik, Roelof; NL
BONNEMA, Gerrit, Maarten; NL
VAN DER SCHOOT, Harmen, Klaas; NL
VELDHUIS, Gerjan, Peter; NL
KWAN, Yim, Bun, Patrick; NL
Agent:
WOLFS, Marc, J., M.; Internationaal Octrooibureau B.V. P.O. Box 220 NL-5600 AE Eindhoven, NL
Priority Data:
97200706.610.03.1997EP
Title (EN) POSITIONING DEVICE HAVING TWO OBJECT HOLDERS
(FR) DISPOSITIF DE POSITIONNEMENT POURVU DE DEUX SUPPORTS D'OBJET
Abstract:
(EN) A positioning device (3) suitable for use in a lithographic device with an exposure position and a characterization position has a displacement system (35) comprising a first displacement unit (39) and a second displacement unit (41) to which object holders (21, 23) can be coupled alternately. The first displacement unit is suitable for carrying out a first series of positioning steps of a first object holder (21) in a first position and for displacing the first object holder from the first position into an intermediate position (M', M'') between the first position and a second position. The second displacement unit is suitable for carrying out a second series of positioning steps of a second object holder (23) in the second position simultaneously with an independently from the first displacement unit and for displacing the second object holder from the second position into the intermediate position. In the intermediate position, the object holders are exchanged, after which the first series of positioning steps can be carried out by the first displacement unit with the second object holder in the first position and the second series of positioning steps can be carried out by the second displacement unit with the first object holder in the second position.
(FR) Ce dispositif de positionnement (3), conçu pour un appareil lithographique, présentant une position d'exposition et une position de caractérisation, comprend un système de déplacement (35) comportant une première (39) et une seconde (41) unité de déplacement auxquelles on peut coupler en alternance des supports d'objet (21, 23). La première unité de déplacement est conçue pour exécuter, dans une première position, une première série d'étapes de positionnement d'un premier support d'objet (21) et pour déplacer ce premier support de cette première position et le mettre dans une position intermédiaire (M', M'), située entre la première position et une seconde position. La seconde unité de déplacement est conçue pour exécuter, dans une seconde position, une seconde série d'étapes de positionnement d'un second support d'objet (23), en même temps que la première unité de déplacement ou indépendamment de celle-ci, et pour déplacer le second support d'objet de cette seconde position et le mettre dans une position intermédiaire. Dans cette position intermédiaire, les supports d'objet sont échangés, après quoi la première série d'étapes de positionnement peut être exécutée par la première unité de déplacement, le second support d'objet étant alors dans la première position, et la seconde série d'étapes de positionnement peut être exécutée par la seconde unité de déplacement, le premier support d'objet étant alors dans la seconde position.
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Designated States: JP, KR, US
European Patent Office (AT, BE, CH, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE)
Publication Language: English (EN)
Filing Language: English (EN)
Also published as:
KR1020000010868EP0900412EP1450208US6262796USRE040043JP2000511704