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1. (WO1998034092) OBJECT INSPECTION AND/OR MODIFICATION SYSTEM AND METHOD
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/1998/034092 International Application No.: PCT/US1998/001528
Publication Date: 06.08.1998 International Filing Date: 21.01.1998
Chapter 2 Demand Filed: 21.08.1998
IPC:
G01Q 10/00 (2010.01) ,G01Q 30/02 (2010.01) ,G01Q 30/16 (2010.01) ,G01Q 40/00 (2010.01) ,G01Q 40/02 (2010.01) ,G01Q 60/06 (2010.01) ,G01Q 60/10 (2010.01) ,G01Q 60/18 (2010.01) ,G01Q 60/24 (2010.01) ,G01Q 70/02 (2010.01) ,G01Q 70/08 (2010.01) ,G01Q 70/16 (2010.01) ,G01Q 80/00 (2010.01) ,G03F 1/00 (2012.01) ,G03F 7/20 (2006.01) ,G11B 5/23 (2006.01) ,G11B 5/31 (2006.01)
G PHYSICS
01
MEASURING; TESTING
Q
SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING-PROBE MICROSCOPY [SPM]
10
Scanning or positioning arrangements, i.e. arrangements for actively controlling the movement or position of the probe
G PHYSICS
01
MEASURING; TESTING
Q
SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING-PROBE MICROSCOPY [SPM]
30
Auxiliary means serving to assist or improve the scanning probe techniques or apparatus, e.g. display or data processing devices
02
Non-SPM analysing devices, e.g. SEM [Scanning Electron Microscope], spectrometer or optical microscope
G PHYSICS
01
MEASURING; TESTING
Q
SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING-PROBE MICROSCOPY [SPM]
30
Auxiliary means serving to assist or improve the scanning probe techniques or apparatus, e.g. display or data processing devices
08
Means for establishing or regulating a desired environmental condition within a sample chamber
16
Vacuum environment
G PHYSICS
01
MEASURING; TESTING
Q
SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING-PROBE MICROSCOPY [SPM]
40
Calibration, e.g. of probes
G PHYSICS
01
MEASURING; TESTING
Q
SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING-PROBE MICROSCOPY [SPM]
40
Calibration, e.g. of probes
02
Calibration standards or methods of fabrication thereof
G PHYSICS
01
MEASURING; TESTING
Q
SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING-PROBE MICROSCOPY [SPM]
60
Particular types of SPM [Scanning-Probe Microscopy] or apparatus therefor; Essential components thereof
02
Multiple-type SPM, i.e. involving two or more SPM techniques
06
SNOM [Scanning Near-field Optical Microscopy] combined with AFM [Atomic Force Microscopy]
G PHYSICS
01
MEASURING; TESTING
Q
SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING-PROBE MICROSCOPY [SPM]
60
Particular types of SPM [Scanning-Probe Microscopy] or apparatus therefor; Essential components thereof
10
STM [Scanning Tunnelling Microscopy] or apparatus therefor, e.g. STM probes
G PHYSICS
01
MEASURING; TESTING
Q
SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING-PROBE MICROSCOPY [SPM]
60
Particular types of SPM [Scanning-Probe Microscopy] or apparatus therefor; Essential components thereof
18
SNOM [Scanning Near-Field Optical Microscopy] or apparatus therefor, e.g. SNOM probes
G PHYSICS
01
MEASURING; TESTING
Q
SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING-PROBE MICROSCOPY [SPM]
60
Particular types of SPM [Scanning-Probe Microscopy] or apparatus therefor; Essential components thereof
24
AFM [Atomic Force Microscopy] or apparatus therefor, e.g. AFM probes
G PHYSICS
01
MEASURING; TESTING
Q
SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING-PROBE MICROSCOPY [SPM]
70
General aspects of SPM probes, their manufacture or their related instrumentation, insofar as they are not specially adapted to a single SPM technique covered by group G01Q60/196
02
Probe holders
G PHYSICS
01
MEASURING; TESTING
Q
SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING-PROBE MICROSCOPY [SPM]
70
General aspects of SPM probes, their manufacture or their related instrumentation, insofar as they are not specially adapted to a single SPM technique covered by group G01Q60/196
08
Probe characteristics
G PHYSICS
01
MEASURING; TESTING
Q
SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING-PROBE MICROSCOPY [SPM]
70
General aspects of SPM probes, their manufacture or their related instrumentation, insofar as they are not specially adapted to a single SPM technique covered by group G01Q60/196
16
Probe manufacture
G PHYSICS
01
MEASURING; TESTING
Q
SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING-PROBE MICROSCOPY [SPM]
80
Applications, other than SPM, of scanning-probe techniques
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
1
Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
G PHYSICS
11
INFORMATION STORAGE
B
INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
5
Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
127
Structure or manufacture of heads, e.g. inductive
187
Structure or manufacture of the surface of the head in physical contact with, or immediately adjacent to, the recording medium; Pole pieces; Gap features
23
Gap features
G PHYSICS
11
INFORMATION STORAGE
B
INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
5
Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
127
Structure or manufacture of heads, e.g. inductive
31
using thin film
Applicants:
RAVE, L.L.C. [US/US]; 1550 Monteval Lane San Jose, CA 95120, US (AllExceptUS)
KLEY, Victor, B. [US/US]; US (UsOnly)
Inventors:
KLEY, Victor, B.; US
Agent:
KNAUER, Stephen, M. ; Flehr, Hohbach, Test, Albritton & Herbert LLP Suite 3400, 4 Embarcadero Center San Francisco, CA 94111-4187, US
TEST, Aldo, J.; Flehr Hohbach Test Albritton & Herbert L.L.P. Suite 3400 4 Embarcadero Center San Francisco, CA 94111-4187, US
Priority Data:
08/786,62321.01.1997US
08/827,95306.04.1997US
Title (EN) OBJECT INSPECTION AND/OR MODIFICATION SYSTEM AND METHOD
(FR) SYSTEME ET PROCEDE DE CONTROLE ET/OU DE MODIFICATION D'OBJETS
Abstract:
(EN) A system for the measurement, analysis, removal, addition or imaging of material uses nanostructures in conjunction with mechanical, electromagnetic (optical) and electrical means. Such nanostructures and techniques are combined in a system that can modify bulk or large area objects such as silicone waffers and masks for lithography. An SPM system (100) for making modifications to an object (102) comprises an SPM probe for making the modifications to the object, a positioning system (103) for positioning the SPM probe with respect to the object, and a controller for controlling the positioning system such that the modifications of the object are made with the SPM probe particulate matter is removed from the object by the modifications, and the SPM probe makes sweeping motions over the object to sweep away the removed particulate material.g these elements in a system which can modify bulk or large area objects such as silicon wafers, and masks for lithography.
(FR) L'invention concerne un système et un procédé de mesure, d'analyse, de retrait, d'ajout ou de représentation d'un matériau au moyen de nanostructures, associés à un dispositif mécanique, électromagnétique (optique) et électrique. L'invention concerne également des techniques de fabrication de ces nanostructures et des techniques permettant de combiner ces éléments dans un système pouvant modifier des objets volumineux ou à grande surface tels que des tranches de silicum et des masques de lithographie.
Designated States: AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, CA, CH, CN, CU, CZ, DE, DK, EE, ES, FI, GB, GE, GH, GM, GW, HU, ID, IL, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MD, MG, MK, MN, MW, MX, NO, NZ, PL, PT, RO, RU, SD, SE, SG, SI, SK, SL, TJ, TM, TR, TT, UA, UG, US, UZ, VN, YU, ZW
African Regional Intellectual Property Organization (ARIPO) (GH, GM, KE, LS, MW, SD, SZ, UG, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, CH, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)
Also published as:
EP1012584US6337479US20080315092AU1998062508