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1. (WO1998016587) AZO COMPOUNDS AND PROCESS FOR PREPARING THE SAME
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/1998/016587    International Application No.:    PCT/JP1997/003637
Publication Date: 23.04.1998 International Filing Date: 09.10.1997
IPC:
C07D 213/75 (2006.01), C07D 233/90 (2006.01), C07D 235/26 (2006.01), C07D 277/46 (2006.01), C07D 277/82 (2006.01), C09B 29/15 (2006.01), C09B 29/20 (2006.01)
Applicants: KABUSHIKI KAISHA UENO SEIYAKU OYO KENKYUJO [JP/JP]; 4-8, Koraibashi 2-chome, Chuo-ku, Osaka-shi, Osaka 541 (JP) (For All Designated States Except US).
UENO, Ryuzo [JP/JP]; (JP) (For US Only).
KITAYAMA, Masaya [JP/JP]; (JP) (For US Only).
MINAMI, Kenji [JP/JP]; (JP) (For US Only).
WAKAMORI, Hiroyuki [JP/JP]; (JP) (For US Only)
Inventors: UENO, Ryuzo; (JP).
KITAYAMA, Masaya; (JP).
MINAMI, Kenji; (JP).
WAKAMORI, Hiroyuki; (JP)
Agent: AOYAMA, Tamotsu; Aoyama & Partners, IMP Building, 3-7, Shiromi 1-chome, Chuo-ku, Osaka-shi, Osaka 540 (JP)
Priority Data:
8/269985 11.10.1996 JP
Title (EN) AZO COMPOUNDS AND PROCESS FOR PREPARING THE SAME
(FR) COMPOSES AZO ET LEUR PROCEDE DE PREPARATION
Abstract: front page image
(EN)Novel monoazo compounds excellent in water, chemical and solvent resistances and other properties and synthesized by using 2-hydroxynaphthalene-3,6-dicarboxylic acid (or a salt thereof), amide, ureide, or an ester thereof as a coupler.
(FR)L'invention porte sur de nouveaux composés monoazo présentant une excellente résistance à l'eau, aux produits chimiques et aux solvants et d'autres propriétés excellentes, obtenus par synthèse à partir d'acide 2-hydroxynaphtalène-3,6-dicarboxylique (ou de ses sels), ou l'un de ses amide, uréide ou ester, comme agent de couplage.
Designated States: CA, CN, JP, KR, US.
European Patent Office (AT, BE, CH, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)