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Machine translation
1. (WO1998014834) ANTIREFLECTIVE COATING FOR PHOTORESIST COMPOSITIONS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/1998/014834    International Application No.:    PCT/EP1997/005281
Publication Date: 09.04.1998 International Filing Date: 26.09.1997
Chapter 2 Demand Filed:    21.04.1998    
IPC:
G03C 1/835 (2006.01), G03F 7/09 (2006.01)
Applicants: CLARIANT INTERNATIONAL LTD. [CH/CH]; Rothausstrasse 61, CH-4132 Muttenz (CH)
Inventors: MCCULLOCH, Iain; (US).
DAMMEL, Ralph, R.; (US).
CORSO, Anthony, J.; (US).
DING, Shuji; (US).
DURHAM, Dana, L.; (US).
LU, Ping-Hung; (US).
KANG, Ming; (US).
KHANNA, Dinesh, N.; (US)
Agent: HÜTTER, Klaus; Clariant GmbH, Patente, Marken und Lizenzen, Building K 801, Room 2027, D-65926 Frankfurt am Main (DE)
Priority Data:
08/724,109 30.09.1996 US
Title (EN) ANTIREFLECTIVE COATING FOR PHOTORESIST COMPOSITIONS
(FR) REVETEMENT ANTI-REFLECHISSANT POUR COMPOSITIONS DE PHOTORESIST
Abstract: front page image
(EN)The present invention relates to a novel antireflective coating solution and a process for its use in photolithography. The antireflective coating solution comprises a novel polymer and an organic solvent or a mixture of organic solvents, where the novel polymer comprises a unit containing a dye that absorbs from about 180nm to about 450nm and a unit containing a crosslinking group.
(FR)La présente invention concerne une nouvelle solution de revêtement anti-réfléchissante et un procédé pour utiliser cette solution en photolitographie. Cette solution comprend un nouveau polymère et un solvant organique ou un mélange de solvants organiques. Ce nouveau polymère comporte une unité contenant un colorant qui absorbe entre 180 nm et 450 nm environ et une unité contenant un groupe de réticulation.
Designated States: CN, JP, KR, SG.
European Patent Office (AT, BE, CH, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE).
Publication Language: English (EN)
Filing Language: English (EN)