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1. (WO1998014644) A DEVICE FOR EPITAXIALLY GROWING OBJECTS AND METHOD FOR SUCH A GROWTH

Pub. No.:    WO/1998/014644    International Application No.:    PCT/SE1997/001613
Publication Date: Apr 9, 1998 International Filing Date: Sep 25, 1997
IPC: C30B 25/02
C30B 25/14
Applicants: ABB RESEARCH LTD.
OKMETIC LIMITED
FORNELL, Jan-Olov
TUOMINEN, Marko
NYGREN, Bertil
ELLISON, Alex
JANZEN, Erik
GU, Chun-Yuan
BERGE, Rune
KORDINA, Olle
Inventors: FORNELL, Jan-Olov
TUOMINEN, Marko
NYGREN, Bertil
ELLISON, Alex
JANZEN, Erik
GU, Chun-Yuan
BERGE, Rune
KORDINA, Olle
Title: A DEVICE FOR EPITAXIALLY GROWING OBJECTS AND METHOD FOR SUCH A GROWTH
Abstract:
A device for epitaxially growing objects of for instance SiC by Chemical Vapour Deposition on a substrate (13) has means (15) for feeding a first flow of at least a carrier gas and reactive gases needed for the growth into a susceptor (7) towards the substrate and means (25, 29) adapted to conduct an additional flow of gases not participating in said growth substantially in parallel with said first flow along circumferential walls (8) of the susceptor past the substrate and out through outlet means (31) of the susceptor. The device comprises means (25) arranged to separate the path of said first flow from said circumferential walls and guide it at a distance therefrom to the region of said object (28).