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1. (WO1998013664) LASER INTERFEROMETRIC LITHOGRAPHIC SYSTEM PROVIDING AUTOMATIC CHANGE OF FRINGE SPACING

Pub. No.:    WO/1998/013664    International Application No.:    PCT/US1997/016960
Publication Date: Apr 2, 1998 International Filing Date: Sep 24, 1997
IPC: G01B 9/02
G03F 7/20
Applicants: FED CORPORATION
Inventors: GHOSH, Amalkumar, P.
SCHWARTZ JONES, Susan, K.
JONES, Gary, W.
ZIMMERMAN, Steve, M.
LIU, Yachin
Title: LASER INTERFEROMETRIC LITHOGRAPHIC SYSTEM PROVIDING AUTOMATIC CHANGE OF FRINGE SPACING
Abstract:
An interferometric lithographic apparatus (10) includes an arrangement for applying interfering laser beams (11) to a part for producing a first interference pattern. The first interference pattern has a first fringe spacing. A mobile part holder stage (32, 44) is repositioned to change the interference pattern and produce a second fringe spacing (N).