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1. (WO1998002782) SIDELOBE SUPPRESSING ATTENUATED PHASE-SHIFTING MASK
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/1998/002782 International Application No.: PCT/US1997/004868
Publication Date: 22.01.1998 International Filing Date: 25.03.1997
IPC:
G03F 1/00 (2012.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
1
Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Applicants: ADVANCED MICRO DEVICES, INC.[US/US]; One AMD Place Mail Stop 68 Sunnyvale, CA 94088-3453, US
Inventors: SPENCE, Christopher, A.; US
Agent: RODDY, Richard, J.; Advanced Micro Devices, Inc. One AMD Place Mail Stop 68 Sunnyvale, CA 94088-3453, US
Priority Data:
08/680,88716.07.1996US
Title (EN) SIDELOBE SUPPRESSING ATTENUATED PHASE-SHIFTING MASK
(FR) MASQUE DEPHASEUR ATTENUE, SUPPRIMANT LES LOBES SECONDAIRES
Abstract:
(EN) A phase shift mask of the attenuating type for dense array image formation and large feature formation without printing sidelobes. For dense arrays, each zero phase E-field transmitting region (103) is surrounded by a 180 degree phase transmitting region (104) and an opaque non-transmitting region (105) is centrally located between each adjacent four zero phase regions. For large features, opaque material borders each corner and along long lines.
(FR) L'invention concerne un masque déphaseur à atténuation conçu pour la formation de matrices d'image et de détails de grande taille sans lobes secondaires d'impression. Pour les matrices denses, chaque zone de transmission électrique à phase nulle (103) est entourée par une zone de transmission (104) ayant une phase de 180° et une zone de non-transmission opaque (105) est placée de manière centrale entre chacune des quatre zones à phase nulle adjacentes. Pour les détails de grande taille, un matériau opaque borde chaque angle et longe les lignes longues.
Designated States: JP, KR
European Patent Office (EPO) (AT, BE, CH, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE)
Publication Language: English (EN)
Filing Language: English (EN)