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1. WO1997045770 - RECONFIGURABLE MASK

Publication Number WO/1997/045770
Publication Date 04.12.1997
International Application No. PCT/US1997/008745
International Filing Date 23.05.1997
Chapter 2 Demand Filed 19.12.1997
IPC
G03F 7/20 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
G03F 1/26 2012.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
1Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
26Phase shift masks ; PSM blanks; Preparation thereof
CPC
G03F 1/26
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
1Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
26Phase shift masks [PSM]; PSM blanks; Preparation thereof
G03F 7/70291
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70216Systems for imaging mask onto workpiece
70283Masks or their effects on the imaging process, e.g. Fourier masks, greyscale masks, holographic masks, phase shift masks, phasemasks, lenticular masks, multiple masks, tilted masks, tandem masks
70291Addressable masks
Applicants
  • CHIU, Tzu-Yin [US]/[US]
Inventors
  • CHIU, Tzu-Yin
Agents
  • ABRAMS, Samuel, B.
Priority Data
08/654,98529.05.1996US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) RECONFIGURABLE MASK
(FR) MASQUE RECONFIGURABLE
Abstract
(EN)
A reconfigurable mask for forming erasable patterns is disclosed. The mask includes material having optical properties manipulated by non physical means. In a preferred embodiment, the mask includes a liquid crystal array formed by materials that are transparent to the exposure light. A phase-shift mask can also be formed by controlling the refractive index of each cell. The mask can be used to form mask patterns that compensate for overexposure at corners of a mask pattern. The reconfigurable mask (10) comprises two ultra-flat and defect-free quartz plates (20 and 25), a conductor layer (30), an array of individual capacitive electrodes (35), two dielectric layers (40 and 45), liquid crystal material (50), and two polarizers (55 and 60).
(FR)
La présente invention concerne un masque reconfigurable permettant de former des motifs effaçables. Ce masque comporte un matériau optique que l'on peut faire varier par des moyens non physiques. Selon une réalisation préférée, le masque comporte une matrice à cristaux liquides en matériaux transparents à la lumière d'exposition. Il est également possible de réaliser un masque à déphasage en agissant sur l'indice de réfraction de chaque cellule. Un tel masque convient à la réalisation de motifs de masque permettant de compenser la surexposition dans les coins du motif de masque. Ce masque reconfigurable (10) est constitué de deux plaques de quartz (20, 25) ultra-plates et sans défauts, d'une couche électroconductrice (30), d'une matrice d'électrodes capacitives (35) discrètes, de deux couches diélectriques (40, 45), d'un matériau de type cristal liquide (50), et de deux polariseurs (55, 60).
Also published as
Latest bibliographic data on file with the International Bureau