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Machine translation
1. (WO1997038802) POLYMERIC SELF-ASSEMBLED MONO- AND MULTILAYERS AND THEIR USE IN PHOTOLITHOGRAPHY
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/1997/038802    International Application No.:    PCT/US1997/006076
Publication Date: 23.10.1997 International Filing Date: 11.04.1997
Chapter 2 Demand Filed:    12.11.1997    
IPC:
B05D 1/18 (2006.01), G03F 7/025 (2006.01), G03F 7/16 (2006.01)
Applicants: THE TEXAS A & M UNIVERSITY SYSTEM [US/US]; 310 Wisenbaker, College Station, TX 77843-3369 (US)
Inventors: CROOKS, Richard, M.; (US).
KIM, Taisun; (KR).
CHAN, Kwok-Chu; (US).
SCHOER, Jonathan, K.; (US)
Agent: JOHNSON, William, R.; Fish & Richardson P.C., 601 Thirteenth Street, N.W., Washington, DC 20005 (US)
Priority Data:
08/631,213 12.04.1996 US
Title (EN) POLYMERIC SELF-ASSEMBLED MONO- AND MULTILAYERS AND THEIR USE IN PHOTOLITHOGRAPHY
(FR) STRUCTURES POLYMERES MONO- OU MULTICOUCHES AUTO-ASSEMBLEES ET LEUR UTILISATION EN PHOTOLITHOGRAPHIE
Abstract: front page image
(EN)A self-assembled multilayer and in particular polymeric self-assembled multilayer can be effectively produced from two or more self-assembled monolayers on a substrate where each of the self-assembled monolayers is produced for a block containing a first functional group and a second functional group where the second functional group is reacted with the first functional group. The production of polymerizable, self-assembled mono- and multilayers from, e.g., blocs containing at least two acetylene groups and/or polymerizable end groups, is also provided. The polymerized mono- or multilayer can be employed in a variety of applications including photolithography.
(FR)Une structure multicouche auto-assemblée, et plus particulièrement une structure multicouche polymère auto-assemblée, peut être produite efficacement à partir d'au moins deux structures monocouches auto-assemblées placées sur un substrat. Chacune des couches auto-assemblées est produite à partir d'un bloc contenant un premier groupement fonctionnel et un second groupement fonctionnel, le second étant mis en réaction avec le premier. L'invention concerne également la production de structures mono- et multicouches auto-assemblées polymérisables, par exemple à partir de blocs contenant au moins deux groupes acétylène et/ou des groupes terminaux polymérisables. Ces structures mono- ou multicouches polymérisées sont utiles dans divers domaines notamment dans la photolithographie.
Designated States: AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, CA, CH, CN, CU, CZ, DE, DK, EE, ES, FI, GB, GE, HU, IL, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MD, MG, MK, MN, MW, MX, NO, NZ, PL, PT, RO, RU, SD, SE, SG, SI, SK, TJ, TM, TR, TT, UA, UG, UZ, VN.
African Regional Intellectual Property Organization (GH, KE, LS, MW, SD, SZ, UG)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, CH, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)