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1. (WO1997017482) ELECTROPLATING PROCESSES COMPOSITIONS AND DEPOSITS
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/1997/017482 International Application No.: PCT/GB1996/002652
Publication Date: 15.05.1997 International Filing Date: 31.10.1996
Chapter 2 Demand Filed: 09.05.1997
IPC:
C25D 3/48 (2006.01) ,C25D 3/62 (2006.01)
C CHEMISTRY; METALLURGY
25
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
D
PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; JOINING WORKPIECES BY ELECTROLYSIS; APPARATUS THEREFOR
3
Electroplating; Baths therefor
02
from solutions
48
of gold
C CHEMISTRY; METALLURGY
25
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
D
PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; JOINING WORKPIECES BY ELECTROLYSIS; APPARATUS THEREFOR
3
Electroplating; Baths therefor
02
from solutions
56
of alloys
62
containing more than 50% by weight of gold
Applicants:
ENTHONE-OMI INC. [US/US]; 350 Frontage Road West Haven, CT 06516, US (AL, AM, AT, AU, AZ, BA, BE, BF, BG, BJ, BR, BY, CA, CF, CG, CH, CI, CM, CN, CU, CZ, DE, DK, EE, ES, FI, FR, GA, GB, GE, GN, GR, HU, IE, IL, IS, IT, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MC, MD, MG, MK, ML, MN, MR, MW, MX, NE, NL, NO, NZ, PL, PT, RO, RU, SD, SE, SG, SI, SK, SN, SZ, TD, TG, TJ, TM, TR, TT, UA, UG, UZ, VN)
KEARNEY, Kevin, David, Nicholas [GB/GB]; GB (BB)
GIORIA, Jean-Michel [CH/CH]; CH (UsOnly)
Inventors:
GIORIA, Jean-Michel; CH
Agent:
KEARNEY, Kevin, David, Nicholas ; Kilburn & Strode 20 Red Lion Street London WC1R 4PJ, GB
Priority Data:
9522591.803.11.1995GB
9522997.709.11.1995GB
Title (EN) ELECTROPLATING PROCESSES COMPOSITIONS AND DEPOSITS
(FR) PROCEDES DE DEPOT ELECTROLYTIQUE, COMPOSITIONS ET DEPOTS
Abstract:
(EN) There is provided an electrodeposit free of cobalt, cadmium and nickel which contains 1.25 to 1.55 % w/w iron, 1 to 2 ppm zirconium; and 97.7 to 98.2 % gold and has a pale yellow colour less than 3N on the NIHS scale. The invention also provides an electroplating bath, free of cobalt, cadmium and nickel comprising gold, as cyanide, iron as a soluble salt or complex, a soluble zirconium salt or complex, a citrate, a weak acid, and optionally a heterocyclic sulphonate, which in a preferred form comprises gold as cyanide in an amount of 2.5 to 3.5 g/l gold, iron as iron nitrate in an amount of 0.6 to 0.8 g/l, zirconium as zirconium nitrate in an amount of 0.2 to 0.5 g/l, diammonium hydrogen citrate in an amount of 75 to 125 g/l, citric acid in an amount of 40 to 80 g/l, and 3-(1-pyridino)-1-propane sulphonate in an amount of 1 to 3 g/l.
(FR) L'invention concerne un dépôt électrolytique exempt de cobalt, de cadmium et de nickel, contenant 1,25 à 1,55 % en poids de fer, 1 à 2 ppm de zirconium et 97,7 à 98,2 % d'or et présentant une couleur jaune pâle inférieure à 3N sur l'échelle NIHS. L'invention concerne également un bain de dépôt électrolytique, exempt de cobalt, de cadmium et de nickel, contenant de l'or en tant que cyanure, du fer en tant que sel ou complexe soluble, un sel ou un complexe soluble de zirconium, un citrate, un acide faible et éventuellement, un sulfonate hétérocyclique, qui, dans une forme préférée, comprend de l'or en tant que cyanure à raison de 2,5 à 3,5 g/l d'or, du fer en tant que nitrate de fer à raison de 0,6 à 0,8 g/l, du zirconium en tant que nitrate de zirconium à raison de 0,2 à 0,5 g/l, du citrate d'hydrogène de diammonium à raison de 75 à 125 g/l, de l'acide citrique à raison de 40 à 80 g/l et sulfonate de 3-(1-pyridino)-1-propane à raison de 1 à 3 g/l.
Designated States: AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, CA, CH, CN, CU, CZ, DE, DK, EE, ES, FI, GB, GE, HU, IL, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MD, MG, MK, MN, MW, MX, NO, NZ, PL, PT, RO, RU, SD, SE, SG, SI, SK, TJ, TM, TR, TT, UA, UG, US, UZ, VN
African Regional Intellectual Property Organization (ARIPO) (KE, LS, MW, SD, SZ, UG)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, CH, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)
Also published as:
EP0871801US6576114CN1200774CA2235408KR1019990067295AU1996073209