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1. (WO1997017147) PROCESS FOR BRUSH CLEANING
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/1997/017147 International Application No.: PCT/US1996/018095
Publication Date: 15.05.1997 International Filing Date: 08.11.1996
Chapter 2 Demand Filed: 04.06.1997
IPC:
A46B 17/04 (2006.01) ,B08B 1/00 (2006.01) ,B08B 7/00 (2006.01) ,H01L 21/00 (2006.01)
A HUMAN NECESSITIES
46
BRUSHWARE
B
BRUSHES
17
Accessories for brushes
04
Protective covers for the bristles
B PERFORMING OPERATIONS; TRANSPORTING
08
CLEANING
B
CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
1
Cleaning by methods involving the use of tools, brushes, or analogous members
B PERFORMING OPERATIONS; TRANSPORTING
08
CLEANING
B
CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
7
Cleaning by methods not provided for in a single other subclass or a single group in this subclass
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Applicants:
ONTRAK SYSTEMS, INC. [US/US]; 1010 Rincon Circle San Jose, CA 95131, US (AllExceptUS)
SIMMONS, Mark, A. [US/US]; US (UsOnly)
KRUSELL, Wilbur, C. [US/US]; US (UsOnly)
Inventors:
SIMMONS, Mark, A.; US
KRUSELL, Wilbur, C.; US
Agent:
MALLIE, Michael, J. ; Blakely, Sokoloff, Taylor & Zafman 7th floor 12400 Wilshire Boulevard Los Angeles, CA 90025-1026, US
Priority Data:
08/555,16408.11.1995US
Title (EN) PROCESS FOR BRUSH CLEANING
(FR) PROCEDE DE NETTOYAGE DE BROSSES
Abstract:
(EN) A process for brush cleaning used in semiconductor wafer scrubbing systems. A process for brush cleaning that eliminates and/or reduces the load-up of brushes with contaminants. This brush cleaning process changes the pH level of a brush to repel contaminants that are on the brush. This process extends the useful life of the brush without significantly decreasing the throughput of the scrubbing system.
(FR) Ce procédé de nettoyage de brosses s'utilise avec des machines de nettoyage de galettes de semiconducteurs. Il consiste à éliminer ou à limiter l'accumulation des contaminants sur des brosses en modifiant le pH de ces dernières pour exercer une répulsion sur les contaminants qui s'y trouvent. Ce procédé prolonge la durée d'utlisation des brosses sans diminuer de façon significative la vitesse de fonctionnement des machines de nettoyage.
Designated States: AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, CA, CH, CN, CU, CZ, DE, DK, EE, ES, FI, GB, GE, HU, IL, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MD, MG, MK, MN, MW, MX, NO, NZ, PL, PT, RO, RU, SD, SE, SG, SI, SK, TJ, TM, TR, TT, UA, UG, US, UZ, VN
African Regional Intellectual Property Organization (ARIPO) (KE, LS, MW, SD, SZ, UG)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, CH, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)
Also published as:
EP0859672JP2000500616AU1996076776