Some content of this application is unavailable at the moment.
If this situation persists, please contact us atFeedback&Contact
1. (WO1997016826) SPUTTERED THERMALLY CYCLED TEXTURE LAYERS FORMED OF HIGH MELTING POINT MATERIALS
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/1997/016826 International Application No.: PCT/US1995/014225
Publication Date: 09.05.1997 International Filing Date: 03.11.1995
IPC:
C23C 14/54 (2006.01) ,G11B 5/84 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
54
Controlling or regulating the coating process
G PHYSICS
11
INFORMATION STORAGE
B
INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
5
Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
84
Processes or apparatus specially adapted for manufacturing record carriers
Applicants:
SEAGATE TECHNOLOGY, INC. [US/US]; 920 Disc Drive Scotts Valley, CA 95066, US (AllExceptUS)
GAO, Chuan [CN/US]; US (UsOnly)
MASSEY, Darrin [US/US]; US (UsOnly)
Inventors:
GAO, Chuan; US
MASSEY, Darrin; US
Agent:
NIEBUHR, Frederick, W. ; Suite 820 900 Second Avenue South Minneapolis, MN 55402, US
Priority Data:
Title (EN) SPUTTERED THERMALLY CYCLED TEXTURE LAYERS FORMED OF HIGH MELTING POINT MATERIALS
(FR) COUCHES TEXTUREES ORGANISEES EN CYCLES, THERMIQUEMENT EVAPOREES ET FORMEES DE MATERIAUX A POINT DE FUSION ELEVE
Abstract:
(EN) A process for fabricating a magnetic data storage medium includes formation of a controlled texture, either over an annular transducing head contact area or the entire surface of a substrate. The texture layer is formed by vacuum deposition of a texturing material onto a smooth surface of a non-magnetic substrate. The texturing material has a surface energy greater than that of the substrate, and the texturing material and substrate material have different linear coefficients of thermal expansion. Just before deposition of the texture layer, the substrate is heated to a temperature of 200 - 600 °C, then allowed to cool during texture layer deposition. The substrate and texture layer contract at different rates as they cool, inducing mechanical stresses within the texture layer sufficient to plastically deform the texture layer, creating multiple dome-like bumps. Subsequent thin film layers, including an underlayer, a magnetic recording layer and a protective cover layer, have uniform thicknesses and tend to replicate the texture layer topography. The resulting medium performs well under CSS testing at flying heights of less than 1.0 microinch, and exhibits excellent corrosive resistance when the substrate is formed of glass, glass ceramic or quartz. The process can be performed on all conventional types of substrates, including aluminum nickel-phosphorous substrates.
(FR) Procédé de fabricatin d'un dispositif magnétique de stockage de données, consistant à former une texture régulière, soit sur une zone de contact annulaire d'une tête transductrice, soit sur l'ensemble de la surface d'un substrat. La couche texturée est formée par dépôt sous vide d'un matériau texturant sur une surface lisse d'un substrat non magnétique. L'énergie superficielle du matériau texturant est supérieure à celle du substrat, les coefficients linéaires de dilatation thermique du matériau texturant étant différents de ceux du matériau composant le substrat. Juste avant le dépôt de la couche texturée, le substrat est chauffé à une température de 200 à 600 °C, puis mis à refroidissement pendant la phase de dépôt de la couche texturée. Le substrat et la couche texturée se contractent à des coefficients différents au refroidissement, ce qui génère dans la couche texturée des contraintes mécaniques suffisantes pour entraîner une déformation plastique de la couche texturée, avec formation d'une multitude de bosses de forme arrondie. Les couches de film minces qui en résultent, composées d'une sous-couche, d'une couche d'enregistrement magnétique et d'une couche de couverture protectrice, sont d'une épaisseur uniforme et ont tendance à reproduire la topographie de la couche texturée. Le support ainsi formé donne de bons résultats lors des essais CSS à des hauteurs de survol inférieures à 1 micropouce. De plus, il présente une excellente résistance à la corrosion lorsque le substrat est constitué de verre, de vitrocérame ou de quartz. Le procédé peut être appliqué sur tous les types de substrats classiques, y compris sur des substrats alumino-nickel phosphoreux.
Designated States: JP, KR, SG, US
European Patent Office (AT, BE, CH, DE, DK, ES, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE)
Publication Language: English (EN)
Filing Language: English (EN)
Also published as:
SG51037EP0801793US5928750JPH10512386 DE000069521911KR1019987001120