Some content of this application is unavailable at the moment.
If this situation persists, please contact us atFeedback&Contact
1. (WO1997016406) PHOTOSENSITIVE INTRAMOLECULAR ELECTRON TRANSFER COMPOUNDS
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/1997/016406 International Application No.: PCT/US1996/017561
Publication Date: 09.05.1997 International Filing Date: 30.10.1996
Chapter 2 Demand Filed: 06.05.1997
IPC:
C07C 25/18 (2006.01) ,C07C 211/62 (2006.01) ,C07C 211/63 (2006.01) ,C07C 225/16 (2006.01) ,C07C 225/22 (2006.01) ,C07D 311/16 (2006.01) ,C07F 5/02 (2006.01) ,C08F 2/50 (2006.01) ,G03F 7/029 (2006.01)
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
C
ACYCLIC OR CARBOCYCLIC COMPOUNDS
25
Compounds containing at least one halogen atom bound to a six-membered aromatic ring
18
Polycyclic aromatic halogenated hydrocarbons
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
C
ACYCLIC OR CARBOCYCLIC COMPOUNDS
211
Compounds containing amino groups bound to a carbon skeleton
62
Quaternary ammonium compounds
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
C
ACYCLIC OR CARBOCYCLIC COMPOUNDS
211
Compounds containing amino groups bound to a carbon skeleton
62
Quaternary ammonium compounds
63
having quaternised nitrogen atoms bound to acyclic carbon atoms
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
C
ACYCLIC OR CARBOCYCLIC COMPOUNDS
225
Compounds containing amino groups and doubly-bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly-bound oxygen atoms not being part of a -CHO group, e.g. amino ketones
02
having amino groups bound to acyclic carbon atoms of the carbon skeleton
14
the carbon skeleton being unsaturated
16
and containing six-membered aromatic rings
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
C
ACYCLIC OR CARBOCYCLIC COMPOUNDS
225
Compounds containing amino groups and doubly-bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly-bound oxygen atoms not being part of a -CHO group, e.g. amino ketones
22
having amino groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
D
HETEROCYCLIC COMPOUNDS
311
Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings
02
ortho- or peri-condensed with carbocyclic rings or ring systems
04
Benzo [b] pyrans, not hydrogenated in the carbocyclic ring
06
with oxygen or sulfur atoms directly attached in position 2
08
not hydrogenated in the hetero ring
16
substituted in position 7
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
F
ACYCLIC, CARBOCYCLIC, OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
5
Compounds containing elements of the 3rd Group of the Periodic System
02
Boron compounds
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
2
Processes of polymerisation
46
Polymerisation initiated by wave energy or particle radiation
48
by ultra-violet or visible light
50
with sensitising agents
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
027
Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
028
with photosensitivity-increasing substances, e.g. photoinitiators
029
Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
Applicants:
SPECTRA GROUP LIMITED, INC. [US/US]; Suite H 1722 Indian Wood Circle Maumee, OH 43537, US
Inventors:
HASSOON, Salah, A.; US
NECKERS, Douglas, C.; US
SARKER, Ananda, M.; US
Agent:
LEVY, Mark, P. ; Thompson Hine & Flory L.L.P. 2000 Courthouse Plaza N.E. P.O. Box 8801 Dayton, OH 45401-8801, US
Priority Data:
08/699,62519.08.1996US
60/008,15831.10.1995US
Title (EN) PHOTOSENSITIVE INTRAMOLECULAR ELECTRON TRANSFER COMPOUNDS
(FR) COMPOSES DE TRANFERT D'ELECTRONS INTRA-MOLECULAIRES PHOTOSENSIBLES
Abstract:
(EN) A compound of the formula (I): A-L-D where A is a moiety which absorbs radiation and enters an excited state in which it accepts an electron; L is a linking group which tethers an electron acceptor moiety A to the electron donor moiety D; D is a moiety which donates an electron to the excited state of the A moiety and releases a free radical; or (II): A-L+D- where A and D are defined as above; and L+ is a cationic group which links the electron donor moiety D to the electron acceptor moiety A.
(FR) Cette invention se rapporte à un composé représenté par la formule (I): A-L-D, où A représente une fraction qui absorbe les rayonnements et qui passe à l'état excité dans lequel elle accepte un électron; L représente un groupe de liaison qui lie une fraction accepteur d'électron (A) à la fraction donneur d'électron (D); D représente une fraction qui donne un électron à la fraction A, lorsque celle-ci se trouve à l'état excité, et qui libère un radical libre; ou par la formule (II): A-L+D-, où A et D sont définis ci-dessus; et L1 représente un groupe cationique qui lie la fraction donneur d'électron (D) à la fraction accepteur d'électron (A).
Designated States: AL, AM, AT, AU, AZ, BB, BG, BR, BY, CA, CH, CN, CZ, DE, DK, EE, ES, FI, GB, GE, HU, IL, IS, JP, KE, KG, KP, KR, KZ, LK, LR, LS, LT, LU, LV, MD, MG, MK, MN, MW, MX, NO, NZ, PL, PT, RO, RU, SD, SE, SG, SI, SK, TJ, TM, TR, TT, UA, UG, UZ, VN
African Regional Intellectual Property Organization (ARIPO) (KE, LS, MW, SD, SZ, UG)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, CH, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)
Also published as:
EP0871607AU1996075516