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1. (WO1997007429) SELF-ASSEMBLED MONOLAYER DIRECTED PATTERNING OF SURFACES

Pub. No.:    WO/1997/007429    International Application No.:    PCT/US1996/013223
Publication Date: Feb 27, 1997 International Filing Date: Aug 16, 1996
IPC: B05D 1/28
B41M 3/00
C23C 16/01
C23C 16/04
G03F 7/00
H01L 21/285
H01L 21/768
Applicants: PRESIDENT AND FELLOWS OF HARVARD COLLEGE
CLEM, Paul, G.
JEON, Noo-Li
MRKSICH, Milan
NUZZO, Ralph, G.
PAYNE, David, A.
WHITESIDES, George, M.
XIA, Younan
Inventors: CLEM, Paul, G.
JEON, Noo-Li
MRKSICH, Milan
NUZZO, Ralph, G.
PAYNE, David, A.
WHITESIDES, George, M.
XIA, Younan
Title: SELF-ASSEMBLED MONOLAYER DIRECTED PATTERNING OF SURFACES
Abstract:
A technique for creating patterns of material deposited on a surface involves forming a self-assembled monolayer in a pattern on the surface and depositing, via chemical vapor deposition or via sol-gel processing, a material on the surface in a pattern complementary to the self-assembled monolayer pattern. The material can be a metal, metal oxide, or the like. The surface can be contoured, including trenches or holes, the trenches or holes remaining free of self-assembled monolayer while the remainder of the surface is coated. When exposed to deposition conditions, metal or metal oxide is deposited in the trenches or holes, and remaining portions of the article surface remain free of deposition. The technique finds particular use in creation of conductive metal pathways selectively within holes passing from one side of a substrate to another.