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1. (WO1997006013) LITHOGRAPHIC SURFACE OR THIN LAYER MODIFICATION

Pub. No.:    WO/1997/006013    International Application No.:    PCT/IB1995/000610
Publication Date: Feb 20, 1997 International Filing Date: Aug 4, 1995
IPC: B41K 1/00
G03F 7/00
H01L 21/768
Applicants: INTERNATIONAL BUSINESS MACHINES CORPORATION
Inventors: BIEBUYCK, Hans, Andre
MICHEL, Bruno
Title: LITHOGRAPHIC SURFACE OR THIN LAYER MODIFICATION
Abstract:
A process for producing lithographic features in a substrate layer is described, comprising the steps of lowering a stamp (15) carrying a reactant (14) onto a substrate (10), confining the subsequent reaction to the desired pattern, lifting said stamp and removing the debris of the reaction from the substrate. Preferably, the stamp carries the pattern to be etched or depressions corresponding to such a patterm. Using the described methods, patterns with submicron features can be generated. The method allows a general solution to parallel handling and transfer of materials in a variety of technical fields.