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1. WO1996038311 - METHOD AND APPARATUS FOR CLEANING SURFACES WITH A GLOW DISCHARGE PLASMA AT ONE ATMOSPHERE OF PRESSURE

Publication Number WO/1996/038311
Publication Date 05.12.1996
International Application No. PCT/US1996/008436
International Filing Date 03.06.1996
Chapter 2 Demand Filed 31.12.1996
IPC
B08B 7/00 2006.01
BPERFORMING OPERATIONS; TRANSPORTING
08CLEANING
BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
7Cleaning by methods not provided for in a single other subclass or a single group in this subclass
B64C 23/00 2006.01
BPERFORMING OPERATIONS; TRANSPORTING
64AIRCRAFT; AVIATION; COSMONAUTICS
CAEROPLANES; HELICOPTERS
23Influencing air-flow over aircraft surfaces, not otherwise provided for
C23G 5/00 2006.01
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
GCLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
5Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
H01J 37/32 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes
H01L 21/306 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02Manufacture or treatment of semiconductor devices or of parts thereof
04the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer
18the devices having semiconductor bodies comprising elements of group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20-H01L21/26142
302to change the physical characteristics of their surfaces, or to change their shape, e.g. etching, polishing, cutting
306Chemical or electrical treatment, e.g. electrolytic etching
CPC
B08B 7/0035
BPERFORMING OPERATIONS; TRANSPORTING
08CLEANING
BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
7Cleaning by methods not provided for in a single other subclass or a single group in this subclass
0035by radiant energy, e.g. UV, laser, light beam or the like
B29C 2059/145
BPERFORMING OPERATIONS; TRANSPORTING
29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
59Surface shaping ; of articles; , e.g. embossing; Apparatus therefor
14by plasma treatment
145Atmospheric plasma
B29C 59/14
BPERFORMING OPERATIONS; TRANSPORTING
29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
59Surface shaping ; of articles; , e.g. embossing; Apparatus therefor
14by plasma treatment
B29K 2023/12
BPERFORMING OPERATIONS; TRANSPORTING
29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
KINDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR ; MOULDS, ; REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
2023Use of polyalkenes ; or derivatives thereof; as moulding material
10Polymers of propylene
12PP, i.e. polypropylene
B63B 1/34
BPERFORMING OPERATIONS; TRANSPORTING
63SHIPS OR OTHER WATERBORNE VESSELS; RELATED EQUIPMENT
BSHIPS OR OTHER WATERBORNE VESSELS; EQUIPMENT FOR SHIPPING 
1Hydrodynamic or hydrostatic features of hulls or of hydrofoils
32Other means for varying the inherent hydrodynamic characteristics of hulls
34by reducing surface friction
B64C 2230/12
BPERFORMING OPERATIONS; TRANSPORTING
64AIRCRAFT; AVIATION; COSMONAUTICS
CAEROPLANES; HELICOPTERS
2230Boundary layer controls
12by using electromagnetic tiles, fluid ionizers, static charges or plasma
Applicants
  • THE UNIVERSITY OF TENNESSEE RESEARCH CORPORATION [US]/[US]
Inventors
  • ROTH, John, Reece
Agents
  • WEISER, Gerard, J.
Priority Data
08/458,13602.06.1995US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) METHOD AND APPARATUS FOR CLEANING SURFACES WITH A GLOW DISCHARGE PLASMA AT ONE ATMOSPHERE OF PRESSURE
(FR) PROCEDE ET DISPOSITIF POUR NETTOYER DES SURFACES PAR PLASMA A DECHARGE LUMINEUSE SOUS UNE PRESSION D'UNE ATMOSPHERE
Abstract
(EN)
The surface of a workpiece is cleaned by generating a steady-state one atmosphere glow discharge plasma above the surface of the workpiece. The use of one atmosphere, uniform glow discharge plasmas generated by a low frequency RF ion trapping mechanisms is prefferred. The plasma used to effect surface cleaning may be formed in atmospheric air or other gases at about one atmosphere of pressure, or at pressures below or above one atmosphere.
(FR)
La surface d'une pièce est nettoyée en produisant un plasma à décharge lumineuse à une atmosphère, à l'équilibre, au-dessus de la surface de ladite pièce. La préférence est donnée à l'utilisation d'une atmosphère, et à des plasmas à décharge lumineuse uniformes produits par un dispositif à haute fréquence de piégeage d'ions à basse fréquence. Le plasma utilisé pour réaliser le nettoyage de surfaces peut être formé dans l'air atmosphérique ou à des pressions inférieures ou supérieures à une atmosphère.
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