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1. (WO1996009289) PHOTOPOLYMERIZABLE COMPOSITION CONTAINING SQUARYLIUM COMPOUND
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/1996/009289    International Application No.:    PCT/JP1995/001894
Publication Date: 28.03.1996 International Filing Date: 20.09.1995
IPC:
C07D 209/60 (2006.01), C09B 57/00 (2006.01), G03F 7/029 (2006.01), G03F 7/031 (2006.01)
Applicants: KYOWA HAKKO KOGYO CO., LTD. [JP/JP]; 6-1, Ohtemachi 1-chome, Chiyoda-ku, Tokyo 100 (JP) (For All Designated States Except US).
YAMAOKA, Tsuguo [JP/JP]; (JP) (For US Only).
KOSEKI, Kenichi [JP/JP]; (JP) (For US Only).
SHIMIZU, Ikuo [JP/JP]; (JP) (For US Only).
TOYODA, Hiroshi [JP/JP]; (JP) (For US Only).
KINOSHITA, Hirotaka [JP/JP]; (JP) (For US Only).
MATSUSHITA, Shoshiro [JP/JP]; (JP) (For US Only)
Inventors: YAMAOKA, Tsuguo; (JP).
KOSEKI, Kenichi; (JP).
SHIMIZU, Ikuo; (JP).
TOYODA, Hiroshi; (JP).
KINOSHITA, Hirotaka; (JP).
MATSUSHITA, Shoshiro; (JP)
Priority Data:
6/226568 21.09.1994 JP
Title (EN) PHOTOPOLYMERIZABLE COMPOSITION CONTAINING SQUARYLIUM COMPOUND
(FR) COMPOSITION PHOTOPOLYMERISABLE CONTENANT UN COMPOSE AU SQUARYLIUM
Abstract: front page image
(EN)A photopolymerizable composition comprising a squarylium compound represented by general formula (I), a free-radical generator and an addition-polymerizable compound having at least one ethylenic unsaturation, wherein R represents C¿2?-C¿8? alkyl.
(FR)Composition photopolymérisable comprenant un composé au squarylium représenté par la formule générale (I), un générateur de radicaux libres ainsi qu'un composé polymérisable par addition présentant au moins une insaturation éthylénique, formule dans laquelle R représente alkyle C¿2?-C¿8?.
Designated States: CA, JP, US.
European Patent Office (AT, BE, CH, DE, DK, ES, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)