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1. WO1996007075 - CORRECTOR PLATE CORRECTION OF EXTANT IMAGING SYSTEMS FOR APPROACHING DIFFRACTION LIMIT

Publication Number WO/1996/007075
Publication Date 07.03.1996
International Application No. PCT/US1994/009801
International Filing Date 29.08.1994
Chapter 2 Demand Filed 29.03.1996
IPC
G02B 27/00 2006.01
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
27Optical systems or apparatus not provided for by any of the groups G02B1/-G02B26/119
G03F 7/20 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
CPC
G02B 27/0025
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
27Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
0025for optical correction, e.g. distorsion, aberration
G03F 7/70308
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70216Systems for imaging mask onto workpiece
70308Optical correction elements, filters and phase plates for manipulating, e.g. intensity, wavelength, polarization, phase, image shift
G03F 7/706
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70483Information management, control, testing, and wafer monitoring, e.g. pattern monitoring
70591Testing optical components
706Aberration measurement
Applicants
  • LITEL INSTRUMENTS, INC. [US]/[US]
Inventors
  • McARTHUR, Bruce, B.
  • HUNTER, Robert, O., Jr.
  • SMITH, Adlai, H.
Agents
  • HYNES, William, Michael
Priority Data
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) CORRECTOR PLATE CORRECTION OF EXTANT IMAGING SYSTEMS FOR APPROACHING DIFFRACTION LIMIT
(FR) CORRECTION DE LA PLAQUE CORRECTRICE DES SYSTEMES D'IMAGERIE EXISTANTS PERMETTANT D'APPROCHER LA LIMITE DE LA DIFFRACTION
Abstract
(EN)
An object (O) is projected through the lens system (L) to be corrected to the image plane where the position of the diffraction limited ideal image (I) is readily ascertainable. At least one primary image defect or Seidel Aberration is measured. These aberrations include distortion, curvature of field or Petzval curvature, spherical aberration, coma, and astigmatism. Interferometry is one technique typically used to measure the aberrations of the system. Based on the measurements, the location of an apparent object is computed.
(FR)
Un objet (O) est projeté à travers le système de lentilles (L) pour être corrigé par rapport au plan d'image au niveau duquel on peut facilement déterminer la position de l'image idéale (I) limitée par la diffraction. On mesure au moins un défaut d'image primaire en une aberration de Seidel. Ces aberrations comprennent la distorsion, la courbure de champ en la courbure de Petzual, l'aberration sphérique, l'aberration en coma et l'astigmatisme. L'interférométrie est une technique qu'on utilise classiquement pour mesurer les aberrations du système. Avec ces mesures on peut calculer l'emplacement d'un objet apparent.
Also published as
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