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1. WO1996006205 - SPRING-LOADED MOUNT FOR A ROTATABLE SPUTTERING CATHODE

Publication Number WO/1996/006205
Publication Date 29.02.1996
International Application No. PCT/US1995/010818
International Filing Date 24.08.1995
Chapter 2 Demand Filed 03.03.1996
IPC
C23C 14/34 2006.01
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
34Sputtering
H01J 37/34 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes
34operating with cathodic sputtering
CPC
C23C 14/3407
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
34Sputtering
3407Cathode assembly for sputtering apparatus, e.g. Target
H01J 37/3435
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes, ; e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
34operating with cathodic sputtering
3411Constructional aspects of the reactor
3435Target holders (includes backing plates and endblocks)
H01J 37/3441
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes, ; e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
34operating with cathodic sputtering
3411Constructional aspects of the reactor
3441Dark space shields
Applicants
  • VIRATEC THIN FILMS, INC. [US/US]; 2150 Airport Drive Faribault, MN 55021, US
Inventors
  • TAYLOR, Clifford, L.; US
Agents
  • EGAN, William, J., III; Fish & Richardson P.C. Suite 100 2200 Sand Hill Road Menlo Park, CA 94025, US
Priority Data
08/296,29524.08.1994US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) SPRING-LOADED MOUNT FOR A ROTATABLE SPUTTERING CATHODE
(FR) SUPPORT CHARGE PAR RESSORT POUR CATHODE DE PULVERISATION ROTATIVE
Abstract
(EN)
A rotatable magnetron cathode (52) has one end adapted to be attached to a drive shaft (68) and a free end supported by a yoke (100) suspended from spring-loaded supporting devices (111) attached to a sputtering chamber wall. A dark space shield (54) is attached to the cathode where the cathode connects to the drive shaft of its motor so as to rotate with the cathode. Another dark space shield (20) is attached at the free end of the cathode with an insulator bearing in between such that the cathode can rotate without causing the shield at its front to also rotate. An insulator pad is placed between the yoke and a metal cover piece attached to the shield at the front so as to keep the frontal dark space shield in an electrically floating condition.
(FR)
Une cathode rotative (52) de magnétron comporte une extrémité se fixant à un arbre d'entraînement (68) et une extrémité libre supportée par un joug (100) suspendu à des dispositifs-supports chargés par ressort (111) qui sont fixés à une paroi de la chambre de pulvérisation. Un écran à zone sombre (54) est fixé à la cathode, cette dernière se raccordant à l'arbre d'entraînement de son moteur de façon à ce que l'arbre tourne avec la cathode. Un autre écran à zone sombre (20) est fixé au niveau de l'extrémité libre de la cathode, un palier isolant étant placé entre les deux de sorte que la cathode puisse tourner sans faire également tourner l'écran au niveau de sa partie frontale. Un coussin isolant est placé entre le joug et une pièce de couverture métallique fixée à la partie frontale de l'écran de façon à maintenir l'écran à zone sombre frontale dans un état de flottement électrique.
Latest bibliographic data on file with the International Bureau