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1. WO1996006204 - MAGNET HOUSING FOR A SPUTTERING CATHODE

Publication Number WO/1996/006204
Publication Date 29.02.1996
International Application No. PCT/US1995/010820
International Filing Date 24.08.1995
IPC
C23C 14/34 2006.01
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
34Sputtering
H01J 37/34 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes
34operating with cathodic sputtering
CPC
C23C 14/3407
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
34Sputtering
3407Cathode assembly for sputtering apparatus, e.g. Target
H01J 37/3405
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes, ; e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
34operating with cathodic sputtering
3402using supplementary magnetic fields
3405Magnetron sputtering
H01J 37/3455
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes, ; e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
34operating with cathodic sputtering
3411Constructional aspects of the reactor
345Magnet arrangements in particular for cathodic sputtering apparatus
3455Movable magnets
Applicants
  • VIRATEC THIN FILMS, INC. [US/US]; 2150 Airport Drive Faribault, MN 55021, US
Inventors
  • TAYLOR, Clifford, L.; US
  • CROWLEY, Daniel, T.; US
Agents
  • EGAN, William, J., III; Fish & Richardson P.C. Suite 100 2200 Sand Hill Road Menlo Park, CA 94025, US
Priority Data
08/295,32424.08.1994US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) MAGNET HOUSING FOR A SPUTTERING CATHODE
(FR) CORPS D'AIMANTS POUR CATHODE DE PULVERISATION
Abstract
(EN)
A magnetron cathode (10) having a magnet housing which encloses a magnet array and has a cooling fluid passage therethrough. The magnet housing fills a significant portion of the cathode leaving a passage of relatively low cross section for cooling fluid flow between the magnet housing and a cathode wall. The magnet housing may be hermetically sealed to prevent magnet corrosion and may be provided with rollers which engage the cathode wall to prevent magnet housing deformation due to magnetic forces.
(FR)
Une cathode (10) de magnétron possède un corps qui renferme un groupe d'aimants, cette cathode étant traversée par un tube de fluide de refroidissement. Le corps du groupe d'aimants remplit une grande partie de la cathode, laissant un passage à section transversale relativement réduite pour l'écoulement du fluide de refroidissement entre le corps et une paroi de la cathode. Le corps du groupe d'aimants peut être fermé hermétiquement afin d'empêcher la corrosion des aimants et peut être pourvu de cylindres d'écartement qui viennent en contact avec la paroi de la cathode pour empêcher que le corps du groupe d'aimants se déforme sous l'action des forces magnétiques.
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