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1. WO1996005539 - WATER-LESS LITHOGRAPHIC PLATES

Publication Number WO/1996/005539
Publication Date 22.02.1996
International Application No. PCT/GB1995/001846
International Filing Date 03.08.1995
Chapter 2 Demand Filed 01.03.1996
IPC
B41N 3/08 2006.01
BPERFORMING OPERATIONS; TRANSPORTING
41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
NPRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE OR CONSERVING THEM
3Preparing for use or conserving printing surfaces
08Damping; Neutralising or similar differentiation treatments of lithographic printing formes
G03F 7/40 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
26Processing photosensitive materials; Apparatus therefor
40Treatment after imagewise removal, e.g. baking
CPC
B41N 3/08
BPERFORMING OPERATIONS; TRANSPORTING
41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
NPRINTING PLATES OR FOILS
3Preparing for use and conserving printing surfaces
08Damping; Neutralising or similar differentiation treatments for lithographic printing formes; ; Gumming or finishing solutions, fountain solutions, correction or deletion fluids, or on-press development
G03F 7/40
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
26Processing photosensitive materials; Apparatus therefor
40Treatment after imagewise removal, e.g. baking
Applicants
  • HORSELL PLC [GB/GB]; Nepshaw Lane South Guildersome Morley Leeds LS27 7JQ, GB (AllExceptUS)
  • BENNETT, Peter, Andrew, Reath [GB/GB]; GB (UsOnly)
  • SMITH, Carole-Anne [GB/GB]; GB (UsOnly)
Inventors
  • BENNETT, Peter, Andrew, Reath; GB
  • SMITH, Carole-Anne; GB
Agents
  • MATTHEWS, Richard, Nordan; Ilford Limited Town Lane Mobberley Knutsford Cheshire WA16 7JL, GB
Priority Data
9416204.711.08.1994GB
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) WATER-LESS LITHOGRAPHIC PLATES
(FR) PLAQUES OFFSET A PROCEDE ANHYDRE
Abstract
(EN)
There is described a method of preparing water-less lithographic plate which comprises imagewise exposing a lithographic plate coated with a photosensitive composition, processing the exposed plate in an aqueous based developing liquid to remove those areas of the photosensitive composition which are removable by the developing liquid, drying the plate and coating the plate with an ink releasing coating composition which adheres to those areas of the plate from which the photosensitive composition has been removed, but which does not adhere to those areas of the plate from which the photosensitive composition which has not been removed, further treating the plate to cure or fix the ink-releasing composition thus providing ink-receptive areas of the plate which are those areas of the plate from which the photosensitive composition which has not been removed in the developing liquid and ink-releasing areas of the plate which are covered with the cured ink-releasing composition. Both positive working and negative working lithographic plates can be used in this method to produce positive working water-less plates and negative working water-less plates.
(FR)
L'invention se rapporte à un procédé de préparation d'une plaque offset à procédé anhydre qui consiste à exposer, par projection d'image, une plaque offset enduite d'une composition photosensible, à traiter la plaque exposée dans un liquide de développement à base d'eau pour retirer les parties de la composition photosensible susceptibles d'être enlevées par le liquide de développement, à sécher la plaque et à la recouvrir d'une composition de revêtement de transfert d'encre qui adhère aux parties de la plaque d'où la composition photosensible a été retirée, sans adhérer aux parties de la plaque conservant la composition photosensible, puis à traiter la plaque pour durcir ou fixer la composition de transfert d'encre. On obtient ainsi des parties de plaque retenant l'encre, ces parties étant celles d'où la composition photosensible n'a pas été retirée dans le liquide de développement, et des parties de plaque de transfert d'encre qui sont recouvertes de la composition durcie de transfert d'encre. Ce procédé permet d'utiliser à la fois des plaques offset positives et négatives afin d'obtenir des plaques par procédé anhydre positives et des plaques par procédé anhydre négatives.
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