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1. WO1996003350 - METHOD OF MANUFACTURING PURE WATER OR ULTRAPURE WATER AND APPARATUS FOR MANUFACTURING THE SAME

Publication Number WO/1996/003350
Publication Date 08.02.1996
International Application No. PCT/JP1995/001460
International Filing Date 21.07.1995
IPC
C02F 1/42 2006.01
CCHEMISTRY; METALLURGY
02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
1Treatment of water, waste water, or sewage
42by ion-exchange
C02F 1/44 2006.01
CCHEMISTRY; METALLURGY
02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
1Treatment of water, waste water, or sewage
44by dialysis, osmosis or reverse osmosis
CPC
C02F 1/42
CCHEMISTRY; METALLURGY
02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
1Treatment of water, waste water, or sewage
42by ion-exchange
C02F 1/44
CCHEMISTRY; METALLURGY
02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
1Treatment of water, waste water, or sewage
44by dialysis, osmosis or reverse osmosis
C02F 1/441
CCHEMISTRY; METALLURGY
02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
1Treatment of water, waste water, or sewage
44by dialysis, osmosis or reverse osmosis
441by reverse osmosis
C02F 1/444
CCHEMISTRY; METALLURGY
02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
1Treatment of water, waste water, or sewage
44by dialysis, osmosis or reverse osmosis
444by ultrafiltration or microfiltration
C02F 2103/04
CCHEMISTRY; METALLURGY
02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
2103Nature of the water, waste water, sewage or sludge to be treated
02Non-contaminated water, e.g. for industrial water supply
04for obtaining ultra-pure water
Y10S 210/90
YSECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
10TECHNICAL SUBJECTS COVERED BY FORMER USPC
STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
210Liquid purification or separation
90Ultra pure water, e.g. conductivity water
Applicants
  • ORGANO CORPORATION [JP/JP]; 5-16, Hongo 5-chome Bunkyo-ku Tokyo 113, JP (AllExceptUS)
  • TANABE, Madoka [JP/JP]; JP (UsOnly)
  • KANEKO, Sakae [JP/JP]; JP (UsOnly)
  • SHINDO, Ikuo [JP/JP]; JP (UsOnly)
Inventors
  • TANABE, Madoka; JP
  • KANEKO, Sakae; JP
  • SHINDO, Ikuo; JP
Agents
  • YOSHIDA, Kenji ; 34-12, Kichijoji-honcho 1-chome Musashino-shi Tokyo 180, JP
Priority Data
6/17054922.07.1994JP
6/24023204.10.1994JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) METHOD OF MANUFACTURING PURE WATER OR ULTRAPURE WATER AND APPARATUS FOR MANUFACTURING THE SAME
(FR) PROCEDE ET DISPOSITIF DE PRODUCTION D'EAU PURE OU ULTRAPURE
Abstract
(EN)
Technical Field: pure water or ultrapure water of a reduced boron concentration used suitably for the production of a semiconductor device. Means for solving the problems: the apparatus comprises a primary pure water treatment system provided with a membrane treatment means and adapted to obtain pure water from treated water in a pretreatment unit (1), a tank (9) for storing this primary pure water, and a secondary pure water treatment system provided with an ion exchange means and a membrane treatment means and adapted to obtain ultrapure water from the primary pure water supplied via the tank (9). A boron selective ion exchange resin is provided in a K tower in a two-bed 3-tower type ion exchange unit (3) in the primary pure water treatment system so that this ion exchange resin is laminated on the upstream side of a strong acid ion exchange resin. Owing to the existence of the boron selective ion exchange resin, the boron concentration in the treated water can be reduced stably for a long period of time.
(FR)
Eau pure ou ultrapure présentant une concentration limitée en bore et pouvant s'utiliser efficacement pour la fabrication d'un dispositif à semi-conducteurs. Le dispositif comprend un système primaire de traitement d'eau pure pourvu d'un moyen de traitement à membrane et conçu pour obtenir de l'eau pure à partir d'eau traitée dans un ensemble de traitement préalable (1), un réservoir (9) servant à emmagasiner cette eau pure primaire, ainsi qu'un système secondaire de traitement d'eau pure pourvu d'un moyen échangeur d'ions et d'un moyen de traitement à membrane et conçu pour obtenir de l'eau ultrapure à partir de l'eau pure primaire alimentée par l'intermédiaire du réservoir (9). Une résine échangeuse d'ions présentant une sélectivité pour le bore, se trouve dans une colonne K d'un ensemble échangeur d'ions de type deux lits, trois colonnes dans le système primaire de traitement d'eau pure, de telle manière que ladite résine est déposée du côté amont d'une résine échangeuse d'ions à acide fort. Cette résine échangeuse d'ions présentant une sélectivité pour le bore permet de limiter la concentration en bore dans l'eau traitée, de façon stable et pendant une durée prolongée.
Also published as
DE19580994
Latest bibliographic data on file with the International Bureau