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1. WO1996002932 - AN ELECTRON BEAM DEVICE HAVING A RESISTIVE FOCUSING LENS STRUCTURE AND METHOD FOR MAKING SUCH A DEVICE

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[ EN ]

Claims:

1. An electron beam device, such as a cathode ray mbe, comprising an evacuated envelope including an electron gun comprising electron-beam means for producing in operation at least one electron beam directed to a surface and a resistive focusing lens strucmre for producing a focusing lens field for focusing said at least one electron beam to a spot on said surface, said focusing lens strucmre comprises a resistive material and has supply means to supply a voltage to said focusing lens structure, characterized in that the total resistance of said focusing lens strucmre is larger than 2.5 GΩ and the absolute value of the temperamre coefficient of resistance of said focusing lens strucmre is smaller than 250-iσ6 K 1.
2. The electron beam device of Claim 1, characterized in that said evacuated envelope consists of a display window, a cone and a neck, said electron gun generates in operation three electron beams, said resistive focusing lens strucmre is of the unipotential or bipotential type and comprises three separate substructures surrounding the respective paths of said electron beams, said substructures being electrically connected in parallel, each substructure having a resistance measured between said supply means of larger than 7.5 GΩ.
3. An electron beam device including an electron gun comprising electron-beam means for producing at least one electron beam directed to a surface and a resistive focusing lens strucmre for producing a focusing lens field for focusing said at least one electron beam to a spot on said surface, said focusing lens strucmre comprising:
an elongated mbular member positioned around the path of said at least one electron beam, said mbular member being provided on an inner surface thereof with said at least one resistive focusing lens strucmre, said at least one resistive focusing lens strucmre comprising a resistive material, said resistive material comprising, by weight, about
10%-50% of a conductive material comprising about 40%-100% of a lead ruthenate, about 0% -40% of a lead titanate and about 0% -20% of a ruthenium oxide in about 50% -90% of a glass comprising about 15%-40% of SiO2, about 0.5%-10% of Al2O3 and about 53%-75% of PbO.
4. An electron beam device of Claim 3, characterized in that said resistive material comprises, by weight, about 33%-50% of a conductive material comprising about 40%-60% of a lead ruthenate, about 25%-38% of a lead titanate and about 2%-15% of a ruthenium oxide in about 50% -67% of a glass comprising about 30% -40% of SiO2, about 3%-7.5% of Al2O3 and about 53%-67% of PbO.
5. An electron beam device of Claim 3 or 4, characterized in that said electron beam device comprises a glass envelope consisting of a display window, a cone, a neck and said electron-beam means are situated inside said envelope opposite said window. 6. The electron beam device of Claim 3, 4 or 5, characterized in that said mbular member is made of glass having a softening point of greater than 850 °C.
7. The electron beam device of Claim 3, 4 or 5, characterized in that the lead ruthenate is Pb2Ru2O65, the lead titanate is PbTiO3 and the ruthenium oxide is RuO2.

8. The electron beam device of Claim 7, characterized in that the glass present in the resistive material consists essentially of 57% -61 % by weight of PbO,
34% -37% of SiO2 and 3% -5% of Al2O3 and the conductive material present in the resistive material consists essentially of 48% -51% by weight of Pb2Ru2Oo 5, 34% -37% of PbTiO3 and 14%-15% of RuO2.
9. A method of providing a resistive focusing lens strucmre for an electron beam device comprising electron-beam means for producing at least one electron beam directed to a surface, said focusing lens strucmre being provided on an inside surface of a glass member to be positioned around the path of said at least one electron beam, said method comprising:
forming a suspension of particles of a mixture of, by weight, of about 33%-50% of a conductive material comprising oxide about 40%-60% of a lead ruthenate, about 25% -38% of a lead titanate and about 2%-15% of a ruthenium oxide and of about 50%-67% of a glass comprising about 30%-40% of SiO2, about 3%-7.5% of Al2O3 and about 53% -67% of PbO in a suspending medium consisting essentially of a non-acidic organic liquid having a boiling point of less than 150°C, applying said suspension to said inside surface to thereby provide a coating of said particles on said inside surface, firing said coating at a temperamre of 700° C-900 °C and, before or after firing said coating, patterning said coating.
10. The method of Claim 9, characterized in that the suspending medium consists essentially of at least one aliphatic alcohol of 1-5 carbons.
11. The method of Claim 9, characterized in that the pH of said non-acidic organic liquid is 8-10.

12. The method of Claim 9, characterized in that the weight percentage of solids in the suspension is 30%-50%.
13. The method of Claim 9, characterized in that the particle size of the solids is about 1-3 μm.