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1. WO1996002932 - AN ELECTRON BEAM DEVICE HAVING A RESISTIVE FOCUSING LENS STRUCTURE AND METHOD FOR MAKING SUCH A DEVICE

Publication Number WO/1996/002932
Publication Date 01.02.1996
International Application No. PCT/IB1995/000558
International Filing Date 13.07.1995
Chapter 2 Demand Filed 13.02.1996
IPC
H01J 29/48 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
29Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/113
46Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
48Electron guns
H01J 29/62 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
29Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/113
46Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
58Arrangements for focusing or reflecting ray or beam
62Electrostatic lenses
H04N 9/28 2006.01
HELECTRICITY
04ELECTRIC COMMUNICATION TECHNIQUE
NPICTORIAL COMMUNICATION, e.g. TELEVISION
9Details of colour television systems
12Picture reproducers
16using cathode ray tubes
28Arrangements for convergence or focusing
CPC
H01J 2229/4827
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
2229Details of cathode ray tubes or electron beam tubes
48Electron guns
4824Constructional arrangements of electrodes
4827Electrodes formed on surface of common cylindrical support
H01J 29/488
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
29Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
46Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
48Electron guns
488Schematic arrangements of the electrodes for beam forming; Place and form of the elecrodes
H01J 29/62
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
29Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
46Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
58Arrangements for focusing or reflecting ray or beam
62Electrostatic lenses
H04N 9/28
HELECTRICITY
04ELECTRIC COMMUNICATION TECHNIQUE
NPICTORIAL COMMUNICATION, e.g. TELEVISION
9Details of colour television systems
12Picture reproducers
16using cathode ray tubes
28Arrangements for convergence or focusing
Y10T 29/49099
YSECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
10TECHNICAL SUBJECTS COVERED BY FORMER USPC
TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
29Metal working
49Method of mechanical manufacture
49002Electrical device making
49082Resistor making
49099Coating resistive material on a base
Applicants
  • PHILIPS ELECTRONICS N.V. [NL]/[NL]
  • PHILIPS NORDEN AB [SE]/[SE] (SE)
Inventors
  • OSBORNE, William
  • PRINSEN, Petrus
  • MONTIE, Edwin
  • COSMAN, Edward
Agents
  • KOPPEN, Jan
Priority Data
08/277,44619.07.1994US
08/398,31403.03.1995US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) AN ELECTRON BEAM DEVICE HAVING A RESISTIVE FOCUSING LENS STRUCTURE AND METHOD FOR MAKING SUCH A DEVICE
(FR) DISPOSITIF A FAISCEAU ELECTRONIQUE DOTE D'UNE STRUCTURE DE LENTILLE DE FOCALISATION RESISTIVE ET PROCEDE DE FABRICATION DE CE DISPOSITIF
Abstract
(EN)
A resistive focusing lens structure for an electron beam device wherein the total resistance of the focusing lens structure is larger than 2.5 G$g(V) and the absolute value of the temperature coefficient of resistance is smaller than 250.10-6K-1. Preferably, said resistive focusing lens structure comprises a resistance layer of a fired suspension of a conductive material of a mixture of a lead ruthenate, a lead titanate and a ruthenium oxide in a glass formed of silicon dioxide, aluminum oxide and lead oxide.
(FR)
Dans une structure de lentille de focalisation résistive destinée à un dispositif à faisceau électronique, la résistance totale de cette structure de lentille de focalisation dépasse 2,5 G$g(V) et la valeur absolue du coefficient de température de cette résistance est inférieure à 250.10-6L-1. De préférence, cette structure de lentille de focalisation résistive comprend une couche de résistance obtenue avec une suspension cuite en matériau conducteur composé d'un mélange de ruthénate de plomb, de titanate de plomb et d'un oxyde de ruthénium intégré dans un verre à base de dioxyde de silicium, d'oxyde d'aluminium et d'oxyde de plomb.
Also published as
Latest bibliographic data on file with the International Bureau