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1. WO1996002925 - MAGNETIC THIN FILM AND PRODUCTION METHOD THEREFOR

Publication Number WO/1996/002925
Publication Date 01.02.1996
International Application No. PCT/JP1994/001173
International Filing Date 18.07.1994
Chapter 2 Demand Filed 03.03.1995
IPC
H01F 10/14 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
10Thin magnetic films, e.g. of one-domain structure
08characterised by magnetic layers
10characterised by the composition
12being metals or alloys
14containing iron or nickel
H01F 41/18 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
41Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
14for applying magnetic films to substrates
18by cathode sputtering
CPC
H01F 10/147
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
10Thin magnetic films, e.g. of one-domain structure
08characterised by magnetic layers
10characterised by the composition
12being metals or alloys
14containing iron or nickel
147with lattice under strain, e.g. expanded by interstitial nitrogen
H01F 10/265
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
10Thin magnetic films, e.g. of one-domain structure
26characterised by the substrate or intermediate layers
265Magnetic multilayers non exchange-coupled
H01F 41/18
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
41Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
14for applying magnetic films to substrates
18by cathode sputtering
Applicants
  • TAKAHASHI, Migaku [JP/JP]; JP
Inventors
  • TAKAHASHI, Migaku; JP
Agents
  • FUKUMORI, Hisao; 12, Honshio-cho Shinjuku-ku Tokyo 160, JP
Priority Data
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) MAGNETIC THIN FILM AND PRODUCTION METHOD THEREFOR
(FR) COUCHE MINCE MAGNETIQUE ET PROCEDE DE FABRICATION
Abstract
(EN)
This invention is directed to provide a thin film of iron nitride of high saturation and low coercive force and a method of forming stably at a high speed a thin film of iron nitride without requiring any specific substrate. The method of the present invention uses an opposed-target DC sputtering method, in which Ar and N2 gases are introduced into a film formation chamber, DC power is applied to iron targets in the Ar and N2 gases and a thin film of iron nitride is formed on a substrate. A heat treatment is carried out in vacuum after the formation of the thin film.
(FR)
L'invention concerne une couche mince en nitrure de fer présentant une saturation élevée et un champ coercitif bas, ainsi qu'un procédé de fabrication stable et à vitesse élevée d'une couche mince en nitrure de fer sans utiliser de substrat spécifique. Ce procédé consiste à effectuer une pulvérisation cathodique à courant continu de cibles opposées, de ce fait, on introduit Ar et N2 gazeux dans une chambre de formation de couches, on applique une puissance à courant continu à des cibles en fer dans Ar et N2 gazeux et on obtient une couche mince de nitrure de fer sur un substrat. On effectue un traitement thermique sous vide après la formation de la couche mince.
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