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1. WO1995034025 - METHOD OF REPETITIVELY IMAGING A MASK PATTERN ON A SUBSTRATE, AND APPARATUS FOR PERFORMING THE METHOD

Publication Number WO/1995/034025
Publication Date 14.12.1995
International Application No. PCT/IB1995/000341
International Filing Date 09.05.1995
IPC
G03F 7/20 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
CPC
G03F 7/70675
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70483Information management, control, testing, and wafer monitoring, e.g. pattern monitoring
70616Wafer pattern monitoring, i.e. measuring printed patterns or the aerial image at the wafer plane
70675using latent image
Applicants
  • PHILIPS ELECTRONICS N.V. [NL]/[NL]
  • PHILIPS NORDEN AB [SE]/[SE] (SE)
Inventors
  • TENNER, Manfred, Gawein
  • VAN DER WERF, Jan, Evert
  • VAN UIJEN, Cornelis, Marinus, Johannes
  • DIRKSEN, Peter
Agents
  • COBBEN, Louis, Marie, Hubert
Priority Data
94201577.702.06.1994EP
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) METHOD OF REPETITIVELY IMAGING A MASK PATTERN ON A SUBSTRATE, AND APPARATUS FOR PERFORMING THE METHOD
(FR) PROCEDE DE REPRODUCTION REPETITIVE D'UN MOTIF DE MASQUE SUR UN SUBSTRAT ET DISPOSITIF DE MISE EN ×UVRE DU PROCEDE
Abstract
(EN)
A method and apparatus for repetitively imaging a mask pattern (C) on a substrate (W) are described. Various parameters of the apparatus and the projection lens system (PL) can be measured accurately and reliably and measuring devices of the apparatus can be calibrated by measuring a latent image of a mark by means of a scanning microscope (LID) forming a diffraction-limited radiation spot (Sp) on the photoresist layer on the substrate (W), in which layer the latent image is formed by means of a projection beam (PB).
(FR)
La présente invention concerne un procédé et un dispositif de reproduction répétitive d'un motif de masque (C) sur un substrat. Les différents paramètres du dispositif et de l'optique de projection (PL) peuvent être mesurés avec exactitude et fiabilité. L'étalonnage des instruments de mesure du dispositif s'effectue par la mesure d'une image latente d'un repère au moyen d'un microscope à balayage (LID) qui forme sur la couche de photorésist du substrat (W) une tache (Sp) de rayonnement à diffraction limitée, l'image latente étant formée dans ladite couche à l'aide d'un faisceau de projection (PB).
Also published as
Latest bibliographic data on file with the International Bureau