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Machine translation
1. (WO1994029071) METHOD OF MINIMIZING DIFFRACTION GROOVE FORMATION ON LASER ETCHED SURFACES
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/1994/029071    International Application No.:    PCT/US1994/006693
Publication Date: 22.12.1994 International Filing Date: 07.06.1994
Chapter 2 Demand Filed:    22.12.1994    
IPC:
B23K 26/06 (2006.01), G02C 7/02 (2006.01)
Applicants: BAUSCH & LOMB INCORPORATED [US/US]; One Chase Square, P.O. Box 54, Rochester, NY 14601-0054 (US)
Inventors: SHANNON, John, H.; (US).
McINTYRE, Kevin, J.; (US)
Agent: KRASNOW, David, M.; Bausch & Lomb Incorporated, One Chase Square, P.O. Box 54, Rochester, NY 14601-0054 (US).
LARSON, Craig, E.; Bausch & Lomb Incorporated, P.O. Box 54, One Chase Square, Rochester, NY 14601-0054 (US)
Priority Data:
08/075,704 11.06.1993 US
Title (EN) METHOD OF MINIMIZING DIFFRACTION GROOVE FORMATION ON LASER ETCHED SURFACES
(FR) PROCEDE DE REDUCTION DE FORMATION DE SILLONS DE DIFFRACTION SUR DES SURFACES ATTAQUEES AU LASER
Abstract: front page image
(EN)Laser radiation can be directed through an aperture to a target surface without causing the expected diffraction groove effect by moving the target relative to the stage to which the aperture is attached in such a fashion as to interrupt the diffraction pattern and minimize the production of diffraction grooves.
(FR)On peut diriger un rayonnement laser au travers d'une ouverture vers une surface cible sans provoquer la formation habituelle de sillons de diffraction, en déplaçant la cible par rapport à la platine porte-objet sur laquelle l'ouverture est fixée de telle manière qu'on interrompt le processus de diffraction et minimise la production de sillons de diffraction.
Designated States: AU, BB, BG, BR, BY, CA, CN, CZ, FI, HU, JP, KP, KR, KZ, LK, LV, MG, MN, MW, NO, NZ, PL, RO, RU, SD, SK, UA, UZ, VN.
European Patent Office (AT, BE, CH, DE, DK, ES, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)