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Machine translation
1. (WO1994014862) USING A LEWIS BASE TO CONTROL MOLECULAR WEIGHT OF NOVOLAK RESINS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/1994/014862    International Application No.:    PCT/US1993/012403
Publication Date: 07.07.1994 International Filing Date: 20.12.1993
Chapter 2 Demand Filed:    27.07.1994    
IPC:
C08G 8/08 (2006.01), G03F 7/023 (2006.01)
Applicants: HOECHST CELANESE CORPORATION [US/US]; Route 202-206 North, Somerville, NJ 08876 (US)
Inventors: RAHMAN, M., Dalil; (US).
AUBIN, Daniel, P.; (US).
DURHAM, Dana, L.; (US).
DAMMEL, Ralph, R.; (US)
Agent: SAYKO, Andrew, F., Jr.; Hoechst Celanese Corporation, 86 Morris Avenue, Summit, NJ 07901 (US)
Priority Data:
07/997,942 29.12.1992 US
Title (EN) USING A LEWIS BASE TO CONTROL MOLECULAR WEIGHT OF NOVOLAK RESINS
(FR) UTILISATION D'UNE BASE DE LEWIS POUR MODULER LA MASSE MOLAIRE DE NOVOLAQUES
Abstract: front page image
(EN)The present invention provides methods for producing water insoluble, aqueous alkali soluble novolak resins having a precise and consistent molecular weight, by adjusting the concentration of Lewis base. A method is also provided for producing photoresist composition from such novolak resins and for producing semiconductor devices using such photoresist compositions.
(FR)L'invention concerne des procédés de production de novolaques solubles dans l'alcali aqueux, insolubles dans l'eau, présentant une masse molaire précise et conséquente, par modulation de la concentration de base de Lewis. L'invention porte également sur la production de compositions de photorésist à partir de ces novolaques et de composants à semi-conducteur au moyen de ces compositions de photorésist.
Designated States: JP, KR.
European Patent Office (AT, BE, CH, DE, DK, ES, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE).
Publication Language: English (EN)
Filing Language: English (EN)