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1. (WO1993017147) A METHOD OF COATING A PIEZOELECTRIC SUBSTRATE WITH A SEMI-CONDUCTING MATERIAL AND A METHOD OF PRODUCING A DROPLET EJECTOR ARRANGEMENT INCLUDING THE COATING METHOD
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/1993/017147 International Application No.: PCT/SE1993/000072
Publication Date: 02.09.1993 International Filing Date: 01.02.1993
Chapter 2 Demand Filed: 21.09.1993
IPC:
B41J 2/16 (2006.01) ,C23C 16/24 (2006.01)
B PERFORMING OPERATIONS; TRANSPORTING
41
PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
J
TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
2
Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
005
characterised by bringing liquid or particles selectively into contact with a printing material
01
Ink jet
135
Nozzles
16
Production of nozzles
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
22
characterised by the deposition of inorganic material, other than metallic material
24
Deposition of silicon only
Applicants:
VONASEK, Jiri [SE/SE]; SE (UsOnly)
LARSSON, Stig-Göran [SE/SE]; SE (UsOnly)
ANDERSSON, Ove [SE/SE]; SE (UsOnly)
MARKPOINT DEVELOPMENT AB [SE/SE]; Södra Säterigatan 20 S-417 11 Göteborg, SE (AllExceptUS)
Inventors:
VONASEK, Jiri; SE
LARSSON, Stig-Göran; SE
ANDERSSON, Ove; SE
Agent:
GRAUDUMS, Valdis ; Albihn West AB Box 142 S-401 22 Göteborg, SE
Priority Data:
9200555-225.02.1992SE
Title (EN) A METHOD OF COATING A PIEZOELECTRIC SUBSTRATE WITH A SEMI-CONDUCTING MATERIAL AND A METHOD OF PRODUCING A DROPLET EJECTOR ARRANGEMENT INCLUDING THE COATING METHOD
(FR) PROCEDE POUR REVETIR UN SUBSTRAT PIEZOELECTRIQUE AVEC UN MATERIAU SEMI-CONDUCTEUR ET PROCEDE POUR PRODUIRE UN DISPOSITIF D'EJECTION DE GOUTELETTES COMPRENANT LE PROCEDE DE REVETEMENT.
Abstract:
(EN) A method of coating a piezoelectric substrate with a semi-conducting material by chemical vapour deposition so as to form a coated object which can be easily bonded to another material such as glass. Chemical vapour deposition of a semi-conducting material is performed such that a layer of desired smoothness is deposited on the piezoelectric substrate. Such a method is particularly applicable for piezoceramic ink-jet printers.
(FR) L'invention décrit un procédé de revêtement d'un substrat piézoélectrique avec un matériau semi-conducteur par dépôt en phase gazeuse par procédé chimique de manière à former un objet revêtu pouvant être lié facilement à un autre matériau tel que le verre. Le dépôt en phase gazeuse par procédé chimique d'un matériau semi-conducteur est effectué de sorte qu'une couche de régularité désirée soit déposée sur le substrat piézoélectrique. Un tel procédé s'applique notamment aux imprimantes piézocéramiques à jet d'encre.
Designated States: JP, US
European Patent Office (EPO) (AT, BE, CH, DE, DK, ES, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE)
Publication Language: English (EN)
Filing Language: English (EN)