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1. WO1992017820 - PHOTODEFINABLE INTERLEVEL DIELECTRICS

Publication Number WO/1992/017820
Publication Date 15.10.1992
International Application No. PCT/US1992/002352
International Filing Date 25.03.1992
Chapter 2 Demand Filed 28.09.1992
IPC
G03F 7/038 2006.1
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
038Macromolecular compounds which are rendered insoluble or differentially wettable
H01L 21/312 2006.1
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02Manufacture or treatment of semiconductor devices or of parts thereof
04the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer
18the devices having semiconductor bodies comprising elements of group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20-H01L21/26142
31to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After-treatment of these layers; Selection of materials for these layers
312Organic layers, e.g. photoresist
CPC
G03F 7/0388
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
038Macromolecular compounds which are rendered insoluble or differentially wettable
0388with ethylenic or acetylenic bands in the side chains of the photopolymer
H01L 21/02118
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02Manufacture or treatment of semiconductor devices or of parts thereof
02104Forming layers
02107Forming insulating materials on a substrate
02109characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
02112characterised by the material of the layer
02118carbon based polymeric organic or inorganic material, e.g. polyimides, poly cyclobutene or PVC
H01L 21/02282
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02Manufacture or treatment of semiconductor devices or of parts thereof
02104Forming layers
02107Forming insulating materials on a substrate
02225characterised by the process for the formation of the insulating layer
0226formation by a deposition process
02282liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
Applicants
  • ALLIED-SIGNAL INC. [US]/[US]
Inventors
  • ZUPANCIC, Joseph, James
Agents
  • ROONEY, Gerard, P.
  • WELLS, Harold, N.
Priority Data
676,66728.03.1991US
676,67528.03.1991US
Publication Language English (en)
Filing Language English (EN)
Designated States
Title
(EN) PHOTODEFINABLE INTERLEVEL DIELECTRICS
(FR) DIELECTRIQUES INTERCOUCHES PHOTOPOLYMERISABLES
Abstract
(EN) A predetermined pattern of a dielectric polymer is formed on a substrate from either a first prepolymer which is the ether of the oligomeric condensation product of dihydric phenol and formaldehyde or a mixture of said oligomer with a second prepolymer which is the ether of the oligomeric condensation product of a dialdehyde and 3 to 4 moles of a phenol.
(FR) Dans cette invention on forme sur un substrat une structure prédéterminée d'un polymère diélectrique réalisé à partir d'un premier prépolymère correspondant à l'éther du produit de condensation oligomère du phénol dialcool et du formaldéhyde ou d'un mélange dudit oligomère avec un deuxième prépolymère qui est l'éther du produit de condensation oligomère d'un dialdéhyde et de 3 ou 4 moles d'un phénol.
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