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1. WO1992017527 - POLYSILAZANES AND PROCESS FOR THEIR PREPARATION

Publication Number WO/1992/017527
Publication Date 15.10.1992
International Application No. PCT/FR1992/000300
International Filing Date 03.04.1992
IPC
C07F 7/10 2006.1
CCHEMISTRY; METALLURGY
07ORGANIC CHEMISTRY
FACYCLIC, CARBOCYCLIC, OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
7Compounds containing elements of Groups 4 or 14 of the Periodic System
02Silicon compounds
08Compounds having one or more C-Si linkages
10containing nitrogen
C07F 7/21 2006.1
CCHEMISTRY; METALLURGY
07ORGANIC CHEMISTRY
FACYCLIC, CARBOCYCLIC, OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
7Compounds containing elements of Groups 4 or 14 of the Periodic System
02Silicon compounds
21Cyclic compounds having at least one ring containing silicon but no carbon in the ring
C08G 77/62 2006.1
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
77Macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon
60in which all the silicon atoms are connected by linkages other than oxygen atoms
62Nitrogen atoms
CPC
C07F 7/10
CCHEMISTRY; METALLURGY
07ORGANIC CHEMISTRY
FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
7Compounds containing elements of Groups 4 or 14 of the Periodic System
02Silicon compounds
08Compounds having one or more C—Si linkages
10containing nitrogen ; having a Si-N linkage
C07F 7/21
CCHEMISTRY; METALLURGY
07ORGANIC CHEMISTRY
FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
7Compounds containing elements of Groups 4 or 14 of the Periodic System
02Silicon compounds
21Cyclic compounds having at least one ring containing silicon, but no carbon in the ring
C08G 77/62
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
77Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
60in which all the silicon atoms are connected by linkages other than oxygen atoms
62Nitrogen atoms
Applicants
  • ETAT FRANÇAIS représenté par le DELEGUE GENERAL POUR L'ARMEMENT [FR]/[FR] (AllExceptUS)
  • DUGUET, Etienne [FR]/[FR] (UsOnly)
  • SCHAPPACHER, Michèle [FR]/[FR] (UsOnly)
  • SOUM, Alain [FR]/[FR] (UsOnly)
Inventors
  • DUGUET, Etienne
  • SCHAPPACHER, Michèle
  • SOUM, Alain
Priority Data
91/0418805.04.1991FR
Publication Language French (fr)
Filing Language French (FR)
Designated States
Title
(EN) POLYSILAZANES AND PROCESS FOR THEIR PREPARATION
(FR) POLYSILAZANES ET LEUR PROCEDE DE PREPARATION
Abstract
(EN) Novel polysilazanes characterized in that they are linear and semi-crystalline and in that they comprise patterns of the general formula: -R1R2Si-NMe-SiR3R4-NMe- in which Me is the methyl radical, R1, R2, R3 and R4, the same or different, represent the hydrogen atom or saturated or unsaturated, substituted or unsubstituted, preferably C1 to C8 hydrocarbon radicals. The polysilazanes are obtained by reaction of a cyclodisilazane of the formula: R1R2[Si2N2Me2] R3R4 in which Me is the methyl radical, R1, R2, R3 and R4, the same or different, represent the hydrogen atom or a saturated or unsaturated, substituted or unsubstituted hydrocarbon radical, with a compound which is either a nucleophilic agent, or an anion radical or a strong protonic acid. Finally, the invention concerns a cyclosilazane of the formula: R1R2[Si2N2Me2] R3R4 in which Me is the methyl radical, at least one of the R1, R2, R3 and R4 radicals representing an alkenyl radical and/or the hydrogen atom, the remaining R1, R2, R3 and R4 radicals, the same or different, representing saturated, substituted or unsubstituted, hydrocarbon radicals.
(FR) L'invention concerne de nouveaux polysilazanes caractérisés en ce qu'ils sont linéaires et semicristallins et qu'ils comprennent des motifs de formule générale: -R1R2Si-NMe-SiR3R4-NMe- dans laquelle Me est le radical méthyle, R1, R2, R3 et R4, identiques ou différents, représentent l'atome d'hydrogène ou des radicaux hydrocarbonés saturés ou insaturés, substitués ou non, de préférence de C1 à C8. Les polysilazanes sont obtenus par réaction d'un cyclodisilazane de formule: R1R2[Si2N2Me2] R3R4 dans laquelle Me est le radical méthyle, R1, R2, R3 et R4, identiques ou différents, représentent l'atome d'hydrogène ou un radical hydrocarboné saturé ou insaturé, substitué ou non, avec un composé qui est soit un agent nucléophile, soit un radical anion, soit un acide protonique fort. L'invention concerne enfin un cyclosilazane de formule: R1R2[Si2N2Me2] R3R4 dans laquelle Me est le radical méthyle, au moins un des radicaux R1, R2, R3 et R4 représente un radical alcényle et/ou l'atome d'hydrogène, les radicaux R1, R2, R3 et R4 restants, identiques ou différents, représentent des radicaux hydrocarbonés saturés, substitués ou non.
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