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1. WO1992015952 - AUTOMATIC IMPEDANCE MATCHING APPARATUS AND METHOD

Publication Number WO/1992/015952
Publication Date 17.09.1992
International Application No. PCT/US1991/009671
International Filing Date 26.12.1991
Chapter 2 Demand Filed 16.09.1992
IPC
H03H 11/30 2006.01
HELECTRICITY
03BASIC ELECTRONIC CIRCUITRY
HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
11Networks using active elements
02Multiple-port networks
28Impedance matching networks
30Automatic matching of source impedance to load impedance
CPC
H01J 37/32082
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes, ; e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
32082Radio frequency generated discharge
H01J 37/32174
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes, ; e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
32082Radio frequency generated discharge
32174Circuits specially adapted for controlling the RF discharge
H01J 37/32183
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes, ; e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
32082Radio frequency generated discharge
32174Circuits specially adapted for controlling the RF discharge
32183Matching circuits, impedance matching circuits per se H03H7/38 and H03H7/40
H01J 37/32935
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes, ; e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
32917Plasma diagnostics
32935Monitoring and controlling tubes by information coming from the object and/or discharge
H01J 37/32963
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes, ; e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
32917Plasma diagnostics
32935Monitoring and controlling tubes by information coming from the object and/or discharge
32963End-point detection
H03H 7/40
HELECTRICITY
03BASIC ELECTRONIC CIRCUITRY
HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
7Multiple-port networks comprising only passive electrical elements as network components
38Impedance-matching networks
40Automatic matching of load impedance to source impedance
Applicants
  • ASTEC AMERICA, INC. [US]/[US]
Inventors
  • KEANE, Anthony, Richard, Alan
  • HAUER, Steven, Edward
Agents
  • BARTELS, Donald, L.
Priority Data
661,81327.02.1991US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) AUTOMATIC IMPEDANCE MATCHING APPARATUS AND METHOD
(FR) APPAREIL ADAPTATEUR D'IMPEDANCE AUTOMATIQUE ET PROCEDE
Abstract
(EN)
An automatic impedance matching apparatus (10) for matching an RF-signal generator (2100) to a load (2300), such as a plasma etching chamber, is disclosed. The matching apparatus (10) comprises a matching network (20) having two variable impedance devices (231, 232), a tune detection means (40) for detecting the condition of the impedance match between the RF-signal (2100) and the load (2300) and a control means (50) for modifying the values of the variable impedance components in response to the measured tune condition. The present invention discloses improve reset and convergence means (1000) and eliminates the need for the 'dead-band'. Also disclosed is an improved adjustment means (1300) for adjusting the variable impedance components and a normalization means (1700) for normalizing the input detection signals such that variations in tuning performance due to variations in input power level from the source are substantially reduced.
(FR)
Appareil adaptateur d'impédance automatique (10) destiné à adapter un générateur de signaux RF (2100) à une charge (2300), telle qu'une chambre d'attaque au plasma. L'appareil adaptateur (10) comprend un réseau adaptateur (20) doté de deux dispositifs à impédance variable (231, 232), un dispositif de détection de l'accord (40) destiné à détecter l'état de l'adaptation d'impédance entre le signal RF (2100) et la charge (2300) et un dispositif de commande (50) destiné à modifier les valeurs des composants à impédance variable en réponse à l'état d'accord mesuré. La présente invention décrit un dispositif amélioré de remise à la valeur initiale et de convergence (1000) et élimine le besoin de 'plage neutre'. Sont également décrits un dispositif amélioré de réglage (1300) destiné à régler les composants à impédance variable et un dispositif de normalisation (1700) destiné à normaliser les signaux de détection d'entrée, de sorte que les variations de la performance d'adaptation dues aux variations de l'intensité du courant d'entrée venant de la source sont considérablement réduites.
Also published as
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