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1. WO1992015633 - IMPROVED MANAGEMENT OF WASTE SOLUTION CONTAINING PHOTORESIST MATERIALS

Publication Number WO/1992/015633
Publication Date 17.09.1992
International Application No. PCT/US1992/001403
International Filing Date 02.03.1992
Chapter 2 Demand Filed 11.09.1992
IPC
B01D 61/02 2006.01
BPERFORMING OPERATIONS; TRANSPORTING
01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
DSEPARATION
61Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
02Reverse osmosis; Hyperfiltration
B01D 61/14 2006.01
BPERFORMING OPERATIONS; TRANSPORTING
01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
DSEPARATION
61Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
14Ultrafiltration; Microfiltration
B01D 67/00 2006.01
BPERFORMING OPERATIONS; TRANSPORTING
01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
DSEPARATION
67Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
C02F 1/44 2006.01
CCHEMISTRY; METALLURGY
02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
1Treatment of water, waste water, or sewage
44by dialysis, osmosis or reverse osmosis
G03F 7/30 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
26Processing photosensitive materials; Apparatus therefor
30Imagewise removal using liquid means
CPC
B01D 61/02
BPERFORMING OPERATIONS; TRANSPORTING
01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
DSEPARATION
61Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis, ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
02Reverse osmosis; Hyperfiltration ; ; Nanofiltration
B01D 61/14
BPERFORMING OPERATIONS; TRANSPORTING
01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
DSEPARATION
61Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis, ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
14Ultrafiltration; Microfiltration
B01D 67/0093
BPERFORMING OPERATIONS; TRANSPORTING
01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
DSEPARATION
67Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
0081After-treatment of organic or inorganic membranes
0093Chemical modification
C02F 1/441
CCHEMISTRY; METALLURGY
02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
1Treatment of water, waste water, or sewage
44by dialysis, osmosis or reverse osmosis
441by reverse osmosis
G03F 7/3092
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
26Processing photosensitive materials; Apparatus therefor
30Imagewise removal using liquid means
3092Recovery of material; Waste processing
Applicants
  • E.I. DU PONT DE NEMOURS AND COMPANY [US]/[US]
Inventors
  • STRANTZ, John, Walter, Jr.
Agents
  • KRUKIEL, Charles, E.
Priority Data
663,00401.03.1991US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) IMPROVED MANAGEMENT OF WASTE SOLUTION CONTAINING PHOTORESIST MATERIALS
(FR) GESTION AMELIOREE DES SOLUTIONS D'EFFLUENTS CONTENANT DES MATIERES PHOTORESISTANTES
Abstract
(EN)
The present invention relates to management of photoresist-resin-containing waste solution by feeding non-aged waste to a membrane device having a Desal 5 membrane modified to increase MWCO for uncharged organic molecules sufficiently so that, on a weight basis, alkalizing agent passage is greater than 90 %, photoresist material rejection is essentially complete, color rejection is greater than 95 % and COD rejection is greater than 80 % to produce a clean permeate solution that can be recycled and a concentrate to be removed.
(FR)
La présente invention a trait à la gestion d'une solution d'effluents contenant des résines photorésistantes en déversant lesdits effluents non décantés sur un dispositif à membrane muni d'une membrane Desal 5 tendant à accroître suffisamment la division de masse moléculaire des molécules organiques non chargées pour que, sur la base de la masse, le passage de l'agent alcalifiant est supérieur à 90 %, le rejet de matière photorésistante est pratiquement total, le rejet de colorant est supérieur à 90 % et le rejet de demande chimique en oxygène est supérieur à 80 %, de manière à obtenir une solution filtrée propre pouvant être recyclée et un concentrat à éliminer.
Also published as
Latest bibliographic data on file with the International Bureau