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1. (WO1992009935) METHOD OF AND DEVICE FOR REMOVING RESIST
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/1992/009935 International Application No.: PCT/JP1991/001635
Publication Date: 11.06.1992 International Filing Date: 28.11.1991
IPC:
G03F 7/30 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
26
Processing photosensitive materials; Apparatus therefor
30
Imagewise removal using liquid means
Applicants:
CANON KABUSHIKI KAISHA [JP/JP]; 30-2, Shimomaruko 3-chome Ohta-ku Tokyo 146, JP (AllExceptUS)
IMAMURA, Isao [JP/JP]; JP (UsOnly)
Inventors:
IMAMURA, Isao; JP
Agent:
OGIUE, Toyonori; 3F Tamayanagi Building 3-1, Rokubancho Chiyoda-ku Tokyo 102, JP
Priority Data:
2/32245128.11.1990JP
2/32245228.11.1990JP
Title (EN) METHOD OF AND DEVICE FOR REMOVING RESIST
(FR) PROCEDE ET DISPOSITIF D'ELIMINATION DE RESIST
Abstract:
(EN) A method of and a device for removing resist, which are capable of significantly promoting resist removing action effected by resist removing liquid and of improving uniformity in resist removing action by resist removing liquid to an exceedingly high level by spouting a mixture of resist removing liquid and gas or by alternately spouting resist removing liquid and gas onto said resist.
(FR) Procédé et dispositif d'élimination de résist capables de stimuler de manière significative l'action d'élimination de résist du liquide d'élimination de résist, et capables d'uniformiser davantage l'élimination de résist par ledit liquide d'élimination de résist jusqu'à un niveau très élevé par projection d'un mélange de liquide d'élimination de résist et de gaz ou, dans un autre mode de réalisation, par projection de liquide d'élimination de résist et de gaz sur ledit résist.
Designated States: US
European Patent Office (AT, BE, CH, DE, DK, ES, FR, GB, GR, IT, LU, NL, SE)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)
Also published as:
EP0512117US5443942