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Machine translation
1. (WO1992003376) METHOD FOR MANUFACTURING HIGH TEMPERATURE SUPERCONDUCTIVE OXIDE THIN FILM
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/1992/003376    International Application No.:    PCT/JP1991/001086
Publication Date: 05.03.1992 International Filing Date: 15.08.1991
IPC:
C04B 41/50 (2006.01), C04B 41/85 (2006.01), C23C 14/08 (2006.01), C23C 14/28 (2006.01), H01L 39/24 (2006.01)
Applicants: INTERNATIONAL SUPERCONDUCTIVITY TECHNOLOGY CENTER [JP/JP]; 34-3, Shinbashi 5-chome, Minato-ku, Tokyo 105 (JP) (For All Designated States Except US).
KABUSHIKI KAISHA KOBE SEIKO SHO [JP/JP]; 3-18, Wakinohama-cho 1-chome, Chuo-ku, Kobe-shi, Hyogo 651 (JP) (For All Designated States Except US).
HITACHI DENSEN KABUSHIKI KAISHA [JP/JP]; 1-2, Marunouchi 2-chome, Chiyoda-ku, Tokyo 100 (JP) (For All Designated States Except US).
HASE, Takashi [JP/JP]; (JP) (For US Only).
MORISHITA, Tadataka [JP/JP]; (JP) (For US Only).
OHATA, Katsumi [JP/JP]; (JP) (For US Only).
IZUMI, Hirohiko [JP/JP]; (JP) (For US Only)
Inventors: HASE, Takashi; (JP).
MORISHITA, Tadataka; (JP).
OHATA, Katsumi; (JP).
IZUMI, Hirohiko; (JP)
Agent: UEKI, Kyuichi; Ueki & Co., Room 407, Shinko Bldg., 3-7, Dojima 2-chome, Kita-ku, Osaka-shi, Osaka 530 (JP)
Priority Data:
2/220466 21.08.1990 JP
Title (EN) METHOD FOR MANUFACTURING HIGH TEMPERATURE SUPERCONDUCTIVE OXIDE THIN FILM
(FR) PROCEDE DE FABRICATION D'UNE COUCHE MINCE D'OXYDE SUPRACONDUCTEUR A TEMPERATURE ELEVEE
Abstract: front page image
(EN)A method for manufacturing a high temperature superconductive oxide thin film in which the oxide superconductive thin film is formed under a high partial pressure of oxygen, and there is no necessity of the aftertreatment of keeping the superconductive thin film at a low temperature in an atmosphere of oxygen after forming it. The 'Tc end' is high, and moreover there is no noise when this film is used in a superconductive device. The high temperature superconductive oxide thin film is formed on an oxide substrate by irradiating an oxide target with a laser beam in the atmosphere of oxygen. The laser beam is projected from behind the substrate, and is transmitted through it, and further is projected on the oxide target.
(FR)Procédé de fabrication d'une couche mince d'oxyde supraconducteur à température élevée, selon lequel l'on forme ladite couche sous une pression partielle élevée d'oxygène sans devoir maintenir la couche mince supraconductrice à une faible température dans une atmosphère d'oxygène une fois qu'elle est formée. L'extrémité 'Tc' est élevée et il n'y a aucun bruit lorsque l'on utilise cette couche dans un dispositif supraconducteur. On forme la couche minc d'oxyde supraconducteur à température élevée sur un substrat en oxyde en irradiant une cible en oxyde avec un faisceau laser dans l'atmosphère d'oxygène. Le faisceau laser provient de derrière le substrat et le traverse avant de touche ladite cible en oxyde.
Designated States: US.
European Patent Office (AT, BE, CH, DE, DK, ES, FR, GB, GR, IT, LU, NL, SE).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)