Search International and National Patent Collections

1. (WO1992001081) METHOD AND APPARATUS FOR CO-SPUTTERING AND CROSS-SPUTTERING HOMOGENEOUS FILMS

Pub. No.:    WO/1992/001081    International Application No.:    PCT/US1991/004738
Publication Date: Jan 23, 1992 International Filing Date: Jul 3, 1991
IPC: C23C 14/35
H01J 37/34
Applicants: THE BOC GROUP, INC.
BELKIND, Abraham., I.
DOW, Daniel, B.
FELTS, John, T.
LAIRD, Ronald, E.
SCHULZ, Steven, C.
KIRS, Milan, R.
Inventors: BELKIND, Abraham., I.
DOW, Daniel, B.
FELTS, John, T.
LAIRD, Ronald, E.
SCHULZ, Steven, C.
KIRS, Milan, R.
Title: METHOD AND APPARATUS FOR CO-SPUTTERING AND CROSS-SPUTTERING HOMOGENEOUS FILMS
Abstract:
A method and apparatus for depositing thin homogeneous films by dual target reactive sputtering utilizes dual rotating cylindrical magnetrons driven by an electrical potential and which have different sputtering materials. The result is a technique and apparatus of forming a uniform film on large dynamic or static substrates with high deposition rates. A co-sputtering aspect utilizes the orientation of magnetic structures within one or both of the dual targets to promote target cross-contamination between them. A cross-sputtering aspect utilizes one or more rotating cylindrical targets of the same material onto which a different material is coated by sputtering from yet another target, a combination of the two materials being sputtered onto a substrate from the cylindrical target.