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1. (WO1991018401) MASK TRAY FOR AND METHOD OF LOADING MASK IN LITHOGRAPHY SYSTEM
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/1991/018401 International Application No.: PCT/US1991/003564
Publication Date: 28.11.1991 International Filing Date: 20.05.1991
Chapter 2 Demand Filed: 20.12.1991
IPC:
G03F 7/20 (2006.01) ,H01L 21/68 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
68
for positioning, orientation or alignment
Applicants:
HAMPSHIRE INSTRUMENTS, INC. [US/US]; 10 Carlson Road Rochester, NY 14610, US
Inventors:
WHITCOMB, Preston, X.; US
Agent:
BARRON, Harry, W.; 8221 Glades Road Suite 202 Boca Raton, FL 33434, US
Priority Data:
526,56421.05.1990US
Title (EN) MASK TRAY FOR AND METHOD OF LOADING MASK IN LITHOGRAPHY SYSTEM
(FR) PLATEAU DE MASQUE ET PROCEDE DE CHARGEMENT D'UN MASQUE DANS UN SYSTEME DE LITHOGRAPHIE
Abstract:
(EN) A mask tray (132), used to hold and guide an X-ray mask (38) to the exposure column (36) of an X-ray lithography system (10), includes first and second holding means (148, 150) which engage vertical mask channels (140, 142) in the mask support (136) to hold the mask (38) on the tray (132). The tray (132) is shaped as a wafer and is moved and loaded on the exposure column (36) using the same translation mechanism (16) used to transport wafers being processed. After the mask (38) is aligned with the exposure column (36), the translation mechanism (16) is moved in the Z direction. At the same time vacuum means (39) are engaged to hold the mask (38) on the column (36) and the holding means (148, 150) are released slightly, thereby permitting the mask (38) to jump the last few microns to the column (36). During the jump, the mask (38) is guided by the holding means (148, 150) remaining near the channels (140, 142). Special translation mechanism (16) movements are needed to remove the tray (132).
(FR) Un plateau de masque (132), utilisé pour retenir et guider un masque à rayons X (38) vers la colonne d'exposition (36) d'un système de lithographie par rayons X (10), comprend un premier et second éléments de fixation (148, 150) servant à engager des rainures verticales (140, 142) du masque dans le support de masque (136) afin de retenir le masque (38) sur le plateau (132). Le plateau (132) a la forme d'une tranche et est déplacé et chargé sur la colonne d'exposition (36) par l'intermédiaire du même mécanisme de déplacement (16) qui transporte les tranches devant être traitées. Après que le masque (38) est aligné avec la colonne d'exposition (36), le mécanisme de déplacement (16) est déplacé dans la direction Z. Des éléments de vide (39) sont en même temps actionnés pour retenir le masque (38) sur la colonne (36) et les éléments de fixation (148, 150) sont légèrement relâchés, ce qui permet au masque (38) de sauter par-dessus les quelques derniers microns jusqu'à la colonne (36). Au cours du saut, le masque (38) est guidé par les éléments de fixation (148, 150) qui demeurent près des rainures (140, 142). Des mouvements particuliers du dispositif de déplacement (16) sont nécessaires pour enlever le plateau (132).
Designated States: JP, KR
European Patent Office (AT, BE, CH, DE, DK, ES, FR, GB, GR, IT, LU, NL, SE)
Publication Language: English (EN)
Filing Language: English (EN)
Also published as:
JPH05506544KR1019930700955