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1. (WO1991018400) MASK TRAY FOR AND METHOD OF LOADING MASK IN LITHOGRAPHY SYSTEM
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/1991/018400 International Application No.: PCT/US1991/003565
Publication Date: 28.11.1991 International Filing Date: 20.05.1991
Chapter 2 Demand Filed: 20.12.1991
IPC:
G03F 7/20 (2006.01) ,H01L 21/68 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
68
for positioning, orientation or alignment
Applicants:
HAMPSHIRE INSTRUMENTS, INC. [US/US]; 10 Carlson Road Rochester, NY 14610, US
Inventors:
BAKER, David, G.; US
Agent:
BARRON, Harry, W.; 8221 Glades Road Suite 202 Boca Raton, FL 33434, US
Priority Data:
526,56521.05.1990US
Title (EN) MASK TRAY FOR AND METHOD OF LOADING MASK IN LITHOGRAPHY SYSTEM
(FR) PLATEAU DE MASQUE ET PROCEDE DE CHARGEMENT DE MASQUE DANS UN SYSTEME LITHOGRAPHIQUE
Abstract:
(EN) A pin chuck (68) holds a wafer (40) during translation in an X-ray lithography machine (10). The chuck (68) is designed to be the same size as the wafer (40) and includes a plurality of extensions (106) having tops along a common plane. The space between the extensions is evacuated to hold and level the wafer (40). In order to load or remove a wafer (40) from the chuck (68), three extendable posts (114, 116 and 118) are provided which can be exended to permit a robot arm (92) to position a prealigned wafer (40) thereon for being lowered to the chuck (68) or to remove a wafer (40) therefrom lifted upward from the chuck (68). The three posts (114, 116 and 118) are triangularly positioned within a space sufficiently large to hold the wafer (40) and at the same time sufficiently close enough together to permit the fingers (96 and 98) of the robot arm (92) to fit therearound.
(FR) Un mandrin à picot (68) maintient une pastille (40) pendant la translation dans une machine à lithographier à rayons X. Le mandrin (68) est conçu pour avoir la même taille que la pastille (40) et comporte une pluralité de prolongements (106) dont les extrémités se trouvent sur le même plan. L'espace entre les prolongements est aspiré de manière à maintenir la pastille (40) et à la mettre à niveau. Pour charger ou enlever une pastille (40) du mandrin (68) il existe trois montants étirables (114, 116 et 118) qui peuvent être étirés pour permettre à un bras robotique (92) de mettre en place une pastille préalignée (40) posée sur lui, destinée à être abaissée vers le mandrin (68) ou pour enlever une pastille (40) du mandrin en la soulevant dudit mandrin (68). Les trois montants (114, 116 et 118) sont placés en triangle dans un espace suffisamment grand pour maintenir la pastille (40) et en même temps suffisamment près les uns des autres pour permettre aus pinces (96 et 98) du bras (92) de les enserrer.
Designated States: JP, KR
European Patent Office (AT, BE, CH, DE, DK, ES, FR, GB, GR, IT, LU, NL, SE)
Publication Language: English (EN)
Filing Language: English (EN)
Also published as:
JPH05506543KR1019930700954