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1. (WO1991018259) X-RAY LITHOGRAPHY ALIGNMENT SYSTEM
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/1991/018259 International Application No.: PCT/US1991/003563
Publication Date: 28.11.1991 International Filing Date: 20.05.1991
Chapter 2 Demand Filed: 20.12.1991
IPC:
G03F 7/20 (2006.01) ,G03F 9/00 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
9
Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Applicants:
HAMPSHIRE INSTRUMENTS, INC. [US/US]; 10 Carlson Road Rochester, NY 14610, US
Inventors:
BONI, Robert; US
FRANKEL, Robert, D.; US
Agent:
BARRON, Harry, W.; 8221 Glades Road Suite 202 Boca Raton, FL 33434, US
Priority Data:
526,56321.05.1990US
Title (EN) X-RAY LITHOGRAPHY ALIGNMENT SYSTEM
(FR) SYSTEME D'ALIGNEMENT POUR LITHOGRAPHIE PAR RAYONS X
Abstract:
(EN) An alignment system (86) for an X-ray lighography system (10) has an objective lens (110) positioned over an alignment mark (98) placed on a conventional X-ray mask membrane (37). Four orthogonally mounted light sources (126, 128, 130, and 132) provides light at a wavelength adapted to pass through the membrane (37) material. A similar alignment mark (104) is positioned on the wafer (40) and as it approaches the position of the stationary mask mark (98), the light means (126, 128, 130, and 132) illuminates both marks (98 and 104). Because of the membrane (37) and wafer (40) separation, a portion of the imaged light is deflected along a longer path (114, 116, 118, and 120) and both images are focused on different portions of a charged coupled device (112). By illuminating the four light sources (126, 128, 130, and 132) one at a time, an improved image of the edges (134, 136, 138, and 140) of the marks (98 and 104) is obtained. The images are detected and processed to find when the centers of the two marks (98 and 104) are in alignment.
(FR) Un système d'alignement (86) pour un système de lithographie par rayons X (10) comporte une lentille de l'objectif (110) placée au-dessus d'une marque d'alignement (98) située sur une membrane de masquage de rayons X classique (37). Quatre sources de lumière montées de manière orthogonale (126, 128, 130 et 132) fournissent de la lumière à une longueur d'onde adaptée à traverser le matériau de membrane (37). Une marque d'alignement similaire (104) est située sur la tranche (40) et, alors que celle-ci s'approche de la position de la marque du masque stationnaire (98), les sources de lumière (126, 128, 130, 132) illuminent les deux marques (98, 104). A cause de la séparation entre la membrane (37) et la tranche (40), une partie de l'image de la lumière est déviée le long d'une trajectoire plus longue (114, 116, 118 et 120) et les deux images sont focalisées sur de différentes parties du dispositif à couplage de charge (112). Lorsqu'on allume les quatre sources de lumière (126, 128, 130 et 132) une à la fois, une image améliorée des rebords (134, 136, 138 et 140) des marques (98, 104) est obtenue. Les images sont détectées et analysées pour déterminer l'instant où les centres des deux marques (98, 104) sont en alignement.
Designated States: JP, KR
European Patent Office (AT, BE, CH, DE, DK, ES, FR, GB, GR, IT, LU, NL, SE)
Publication Language: English (EN)
Filing Language: English (EN)
Also published as:
JPH05506507KR1019930700819