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1. (WO1991017967) DYNAMIC SEMICONDUCTOR WAFER PROCESSING USING HOMOGENEOUS CHEMICAL VAPORS
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/1991/017967 International Application No.: PCT/US1991/002796
Publication Date: 28.11.1991 International Filing Date: 19.04.1991
Chapter 2 Demand Filed: 03.12.1991
IPC:
G11B 7/26 (2006.01) ,H01L 21/00 (2006.01)
G PHYSICS
11
INFORMATION STORAGE
B
INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
7
Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation, reproducing using an optical beam at lower power; Record carriers therefor
24
Record carriers characterised by shape, structure or physical properties, or by the selection of the material 
26
Apparatus or processes specially adapted for the manufacture of record carriers
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Applicants:
SEMITOOL, INC. [US/US]; 655 West Reserve Drive Kalispell, MT 59901, US
Inventors:
BERGMAN, Eric, J.; US
Agent:
GREGORY, Randy, A. ; West 601 Main Avenue Suite 815 Spokane, WA 99201-0679, US
Priority Data:
524,23915.05.1990US
526,05221.05.1990US
526,05721.05.1990US
665,94506.03.1991US
Title (EN) DYNAMIC SEMICONDUCTOR WAFER PROCESSING USING HOMOGENEOUS CHEMICAL VAPORS
(FR) TRAITEMENT DYNAMIQUE DES TRANCHES SEMI-CONDUCTRICES A L'AIDE DE PRODUITS CHIMIQUES EN PHASE GAZEUSE HOMOGENE
Abstract:
(EN) Disclosed are methods and apparatuses for combined etching and cleaning of semiconductor wafers and the like using a combined etchant and cleaning agent, particularly hydrofluoric acid (HF) and hydrochloric acid in water mixtures. Homogeneous vapor mixtures are generated from homogeneous liquid phase mixtures which are preferably recirculated, mixed and agitated. The liquid phase is advantageously circulated through a chemical chamber (389) within the processing bowl (314). Exposure of wafers to vapors from the chemical chamber (389) can be controlled by a vapor control valve (385) which forms the bottom of the processing chamber (316). The wafer (20) is rotated or otherwise moved within the processing chamber to provide uniform dispersion of the homogeneous reactant vapors across the wafer surface and to facilitate vapor circulation to the processed surface. A radiative volatilization processor can be utilized to volatilize reaction by-products which form under some conditions. The processes provide efficient uniform etching and cleaning to provide low particle count performance.
(FR) Procédé et appareils de décapage et de nettoyage des tranches semi-conductrices ou analogues à l'aide d'un agent décapant et nettoyant, notamment des mélanges aqueux d'acide fluorhydrique (HF) et d'acide chlorhydrique. On génère des mélanges gazeux homogènes à partir de mélanges homogènes en phase liquide que l'on a de préférence remis en circulation, mélangés et agités. On peut avantageusement faire circuler la phase liquide dans une chambre chimique (389) à l'intérieur de la cuve de traitement (314). On peut réguler l'exposition des tranches aux phases gazeuses provenant de la chambre chimique (389) à l'aide d'un clapet de commande (385) constituant le fond de la chambre de traitement (316). On imprime un mouvement rotatif ou autre à la tranche (20) dans la chambre de traitement afin d'assurer une dispersion uniforme des phases gazeuses homogènes réactives sur la surface de la tranche, et de faciliter leur circulation jusqu'à la surface traitée. Une unité de traitement radiative et vaporisante peut servir à volatiliser les sous-produits réactionnels qui se forment sous certaines conditions. Ces procédés permettent d'effectuer une gravure et un nettoyage uniformes et efficaces assurant un faible nombre de particules.
Designated States: AT, AU, BB, BG, BR, CA, CH, DE, DK, ES, FI, GB, HU, JP, KP, KR, LK, LU, MC, MG, MW, NL, NO, PL, RO, SD, SE, SU
European Patent Office (AT, BE, CH, DE, DK, ES, FR, GB, GR, IT, LU, NL, SE)
African Intellectual Property Organization (BF, BJ, CF, CG, CM, GA, ML, MR, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)
Also published as:
AU1991078880