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1. (WO1991017561) APPARATUS FOR-PLASMA TREATMENT OF CONTINUOUS MATERIAL
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/1991/017561 International Application No.: PCT/US1991/003229
Publication Date: 14.11.1991 International Filing Date: 09.05.1991
Chapter 2 Demand Filed: 09.12.1991
IPC:
B29C 59/14 (2006.01) ,F16J 15/16 (2006.01) ,G03C 1/91 (2006.01) ,H01J 37/20 (2006.01)
B PERFORMING OPERATIONS; TRANSPORTING
29
WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
C
SHAPING OR JOINING OF PLASTICS; SHAPING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL; AFTER- TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
59
Surface shaping, e.g. embossing; Apparatus therefor
14
by plasma treatment
F MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
16
ENGINEERING ELEMENTS OR UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
J
PISTONS; CYLINDERS; PRESSURE VESSELS IN GENERAL; SEALINGS
15
Sealings
16
between relatively-moving surfaces
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
C
PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR OR STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
1
Photosensitive materials
76
Photosensitive materials characterised by the base or auxiliary layers
91
characterised by subbing layers or subbing means
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02
Details
20
Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
Applicants:
EASTMAN KODAK COMPANY [US/US]; 343 State Street Rochester, NY 14650-2201, US (AllExceptUS)
BROWN, Robert, Winston [AU/AU]; AU (UsOnly)
COOPES, Ian, Henry [AU/AU]; AU (UsOnly)
FUSCA, Joseph [AU/AU]; AU (UsOnly)
GIFKINS, Kenneth, John [AU/AU]; AU (UsOnly)
IRVIN, John, Andrew [AU/AU]; AU (UsOnly)
Inventors:
BROWN, Robert, Winston; AU
COOPES, Ian, Henry; AU
FUSCA, Joseph; AU
GIFKINS, Kenneth, John; AU
IRVIN, John, Andrew; AU
Agent:
RUOFF, Carl, F.; 343 State Street Rochester, NY 14650-2201, US
Priority Data:
PK 006610.05.1990AU
PK 283119.10.1990AU
Title (EN) APPARATUS FOR-PLASMA TREATMENT OF CONTINUOUS MATERIAL
(FR) APPAREIL DE TRAITEMENT AU PLASMA D'UNE MATIERE CONTINUE
Abstract:
(EN) An apparatus (1) for continuous treatment of a material (M) of continuous length with a low temperature plasma of a plasma gas (G) under vacuum. The apparatus (1) includes a plasma treatment chamber (3) having a chamber wall (4) and, in the wall (4), an entrance zone (6) and an exit zone (7) for receiving and discharging the continuous material (M). Evacuating means (48) is operable to establish a vacuum in the chamber (3). Support means (9) advances the continuous material (M) along a path (8) through the chamber (3) and also maintains a vacuum seal at the entrance and exit zones (6, 7). The support means (9) includes a backing roller (10) mounted adjacent the entrance and exit zones (6, 7), an entrance sealing roller (11) positioned adjacent the entrance zone (6) and an exit sealing roller (13) positioned adjacent the exit zone (7). The backing roller (10) forms with each sealing roller (11, 13) a respective nip (12, 14) at the entrance and exit zones (6, 7) through which the continuous material (m) passes into and out of the treatment chamber (3). A plasma generating head (53) is posi tioned within the treatment chamber (3) adjacent the path (8) for generating a low temperature plasma which contacts the continuous material (M) while it is advanced through the treatment chamber (3).
(FR) Appareil (1) destiné au traitement continu d'une matière (M) de longueur continue à l'aide d'un plasma à basse température d'un gaz de plasma (G) sous vide. L'appareil (1) comprend une chambre de traitement au plasma (3) présentant une paroi de chambre (4) et, dans ladite paroi (4), une zone d'entrée (6) ainsi qu'une zone de sortie (7) destinée à recevoir et à décharger ladite matière continue (M). Un moyen d'évacuation (48) établit un vide dans la chambre (3). Un moyen de support (9) fait avancer ladite matière continue (M) le long d'un chemin (8) à travers la chambre (3), et il maintient également une étanchéité au vide au niveau des zones d'entrée et de sortie (6, 7). Le moyen de support (9) comprend un rouleau d'appui (10) monté à proximité des zones d'entrée et de sortie (6, 7), un rouleau d'étanchéité d'entrée (11) positionné à proximité de la zone d'entrée (6) ainsi qu'un rouleau d'étanchéité de sortie (13) positionné à proximité de la zone de sortie (7). Ledit rouleau d'appui (10) forme avec chaque rouleau d'étanchéité (11, 13) un pincement respectif (12, 14) au niveau desdites zones d'entrée et de sortie (6, 7) à travers lesquelles la matière continue (m) passe dans la chambre de traitement (3) et hors de celle-ci. Une tête de production de plasma (53) est positionnée à l'intérieur de la chambre de traitement (3) à proximité du chemin (8) afin de produire un plasma à basse température venant au contact de ladite matière continue (M) tandis qu'elle avance dans ladite chambre de traitement (3).
Designated States: AU, JP, US
European Patent Office (AT, BE, CH, DE, DK, ES, FR, GB, GR, IT, LU, NL, SE)
Publication Language: English (EN)
Filing Language: English (EN)
Also published as:
EP0527859US5314539JPH05507383AU1991078621