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1. (WO1991017484) PHOTORESIST STRIPPER
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/1991/017484 International Application No.: PCT/US1990/005898
Publication Date: 14.11.1991 International Filing Date: 15.10.1990
Chapter 2 Demand Filed: 02.12.1991
IPC:
G03F 7/42 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
26
Processing photosensitive materials; Apparatus therefor
42
Stripping or agents therefor
Applicants:
INTERNATIONAL BUSINESS MACHINES CORPORATION [US/US]; Armonk, NY 10504, US
Inventors:
DEAN, Alicia; US
FITZSIMMONS, John, A.; US
HAVAS, Janos; US
McCORMICK, Barry, C.; US
SHAH, Probodh, R.; US
Agent:
MELLER, Michael, N.; Meller & Associates P.O. Box 2198 Grand Central Station New York, NY 10163, US
Priority Data:
517,10501.05.1990US
Title (EN) PHOTORESIST STRIPPER
(FR) AGENT DECOLLEUR DE PHOTORESERVES
Abstract:
(EN) Photoresist stripper compositions comprising N-alkyl-2-pyrrolidone, 1,2-propanediol and tetraalkylammonium hydroxide. The photoresist strippers are useful at high stripping temperatures (105 °C-125 °C) to remove hard baked photoresist without damaging semiconductor substrates or metallurgy.
(FR) L'invention se rapporte à des compositions de décollage de photoréserves, qui comprennent de la N-alkyle-2-pyrrodilone, du 1,2-propanediol et de l'hydroxyde de tétraalkylammonium. Ces décolleurs de photoréserves sont utiles à des températures de décollage élevées (105 °C à 125 °C) pour enlever des photoréserves cuites dures sans endommager les substrats semiconducteurs ou la structure métallique.
Designated States: JP
European Patent Office (AT, BE, CH, DE, DK, ES, FR, GB, GR, IT, LU, NL, SE)
Publication Language: English (EN)
Filing Language: English (EN)
Also published as:
EP0531292