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1. (WO1991009149) GAS PHASE SELECTIVE BEAM DEPOSITION
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/1991/009149 International Application No.: PCT/US1990/007084
Publication Date: 27.06.1991 International Filing Date: 04.12.1990
Chapter 2 Demand Filed: 26.06.1991
IPC:
C23C 16/01 (2006.01) ,C23C 16/04 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
01
on temporary substrates, e.g. on substrates subsequently removed by etching
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
04
Coating on selected surface areas, e.g. using masks
Applicants:
BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM [US/US]; 201 West Seventh Street Austin, TX 78701, US
Inventors:
MARCUS, Harris, L.; US
Agent:
DAFFER, Kevin, L.; Arnold, White & Durkee P.O. Box 4433 Houston, TX 77210, US
PAGENBERG, Jochen ; Galileiplatz 1 D-81679 München, DE
Priority Data:
444,88204.12.1989US
Title (EN) GAS PHASE SELECTIVE BEAM DEPOSITION
(FR) DEPOT SELECTIF EN PHASE GAZEUSE PAR FAISCEAU D'ENERGIE
Abstract:
(EN) A method and apparatus for selectively depositing a layer of material from a gas phase to produce a part comprising a plurality of deposited layers. The apparatus includes a computer controlling a directed energy beam, such as a laser, to direct the laser energy into a chamber substantially containing the gas phase to preferably produce photodecomposition or thermal decomposition of the gas phase and selectively deposit material within the boundaries of the desired cross-sectional regions of the part. For each cross-section, the aim of the laser beam is scanned over a target area and the beam is switched on to deposit material within the boundaries of the cross-section. Each subsequent layer is joined to the immediately preceding layer to produce a part comprising a plurality of joined layers. In an alternate embodiment of the present invention, a gas phase is condensed on a surface and a laser beam is used to selectively evaporate, transform, activate or decompose material in each layer. A subsequent layer is condensed and the evaporation, transformation, activation or decomposition step is repeated to produce a part comprising a plurality of joined layers. The apparatus of the present invention preferably comprises a computer controlled laser generating and scanning system aiming at least one laser beam into a chamber comprising at least one gas phase and controlling the aim and selectively depositing or evaporating material to produce a part.
(FR) Un procédé et un appareil permettent de déposer sélectivement une couche de matériau à partir d'une phase gazeuse de façon à produire une pièce formée d'une pluralité de couches déposées. L'appareil comprend un ordinateur qui commande un faisceau dirigé d'énergie laser dans une chambre qui contient essentiellement la phase gazeuse, produisant de préférence la photodécomposition ou la décomposition thermique de la phase gazeuse et déposant sélectivement du matériau dans les limites des sections transversales voulues de la pièce. Dans chaque section transversale, la cible du faisceau laser balaie une zone cible et le faisceau est commuté de manière à déposer du matériau dans les limites de la section transversale. Chaque couche ultérieure est reliée à la couche qui la précède immédiatement, de façon à produire une pièce formée d'une pluralité de couches reliées. Dans un autre mode de réalisation de l'invention, une phase gazeuse est condensée sur une surface et un faisceau laser est utilisé pour évaporer, transformer, activer ou décomposer sélectivement du matériau dans chaque couche. La couche suivante est condensée et l'étape d'évaporation, de transformation, d'activation ou de décomposition est répétée afin de produire une pièce formée d'une pluralité de couches reliées. L'appareil décrit comprend de préférence un système de génération et de balayage laser commandé par ordinateur, qui dirige un faisceau laser dans une chambre contenant au moins une phase gazeuse, qui règle la direction du faisceau et qui provoque sélectivement le dépôt ou l'évaporation du matériau afin de produire une pièce.
Designated States: AT, AU, BB, BG, BR, CA, CH, DE, DK, ES, FI, GB, HU, JP, KP, KR, LK, LU, MC, MG, MW, NL, NO, RO, SD, SE, SU
European Patent Office (AT, BE, CH, DE, DK, ES, FR, GB, GR, IT, LU, NL, SE)
African Intellectual Property Organization (BF, BJ, CF, CG, CM, GA, ML, MR, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)
Also published as:
EP0589869JPH05504377AU1991071608